Inventor
Miyahara Tatsuya
JP9 patents
Patents
9 patentsUS11260433B2Mar 1, 2022
Cleaning method of substrate processing apparatus and substrate processing apparatus
TOKYO ELECTRON LTD2 citations68
US12080552B2Sep 3, 2024
Method of depositing silicon film and film deposition apparatus
TOKYO ELECTRON LTD0 citations61
US11600490B2Mar 7, 2023
Silicon film forming method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations61
US10892162B2Jan 12, 2021
Silicon film forming method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations61
US12252786B2Mar 18, 2025
Cleaning method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations60
US12438055B2Oct 7, 2025
Abnormality detection method and processing apparatus
TOKYO ELECTRON LTD0 citations58
US12112947B2Oct 8, 2024
Method of crystallizing amorphous silicon film and deposition apparatus
TOKYO ELECTRON LTD0 citations58
US12351904B2Jul 8, 2025
Film deposition method and method for forming polycrystalline silicon film
TOKYO ELECTRON LTD0 citations50
US12571125B2Mar 10, 2026
Method for forming polycrystalline silicon film
TOKYO ELECTRON LTD0 citations48