Inventor
DUBOIS DALE R
US21 patents
⚠️ This page may combine multiple inventors who share the name “DUBOIS DALE R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
14 patentsUS5855687AJan 5, 1999
Substrate support shield in wafer processing reactors
APPLIED MATERIALS INC360 citations99
US6494959B1Dec 17, 2002
Process and apparatus for cleaning a silicon surface
APPLIED MATERIALS INC260 citations97
US6455814B1Sep 24, 2002
Backside heating chamber for emissivity independent thermal processes
APPLIED MATERIALS INC51 citations96
US5522937AJun 4, 1996
Welded susceptor assembly
APPLIED MATERIALS INC58 citations94
US6368567B2Apr 9, 2002
Point-of-use exhaust by-product reactor
APPLIED MATERIALS INC19 citations91
US5332443AJul 26, 1994
Lift fingers for substrate processing apparatus
APPLIED MATERIALS INC62 citations91
US10236197B2Mar 19, 2019
Processing system containing an isolation region separating a deposition chamber from a treatment chamber
APPLIED MATERIALS INC11 citations84
US9725806B2Aug 8, 2017
Multi-zone pedestal for plasma processing
APPLIED MATERIALS INC7 citations84
US10711347B2Jul 14, 2020
Micro-volume deposition chamber
APPLIED MATERIALS INC2 citations73
US6699530B2Mar 2, 2004
Method for constructing a film on a semiconductor wafer
APPLIED MATERIALS INC11 citations73
US7777197B2Aug 17, 2010
Vacuum reaction chamber with x-lamp heater
APPLIED MATERIALS INC7 citations72
US10090187B2Oct 2, 2018
Multi-zone pedestal for plasma processing
APPLIED MATERIALS INC1 citations63
US10971389B2Apr 6, 2021
Multi-zone pedestal for plasma processing
APPLIED MATERIALS INC0 citations62
US10113231B2Oct 30, 2018
Process kit including flow isolator ring
APPLIED MATERIALS INC1 citations52
ANICON INC
5 patentsUS4694778ASep 22, 1987
Chemical vapor deposition wafer boat
ANICON INC311 citations98
US4539933ASep 10, 1985
Chemical vapor deposition apparatus
ANICON INC50 citations91
US4582020AApr 15, 1986
Chemical vapor deposition wafer boat
ANICON INC7 citations73
US4524719AJun 25, 1985
Substrate loading means for a chemical vapor deposition apparatus
ANICON INC18 citations72
US4641604AFeb 10, 1987
Chemical vapor deposition wafer boat
ANICON INC1 citations52