Inventor
PIERREUX DIETER
BE48 patents
⚠️ This page may combine multiple inventors who share the name “PIERREUX DIETER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASM IP HOLDING BV
40 patentsUS9916980B1Mar 13, 2018
Method of forming a structure on a substrate
ASM IP HOLDING BV480 citations98
US9887082B1Feb 6, 2018
Method and apparatus for filling a gap
ASM IP HOLDING BV466 citations98
US9812320B1Nov 7, 2017
Method and apparatus for filling a gap
ASM IP HOLDING BV475 citations98
US9552979B2Jan 24, 2017
Cyclic aluminum nitride deposition in a batch reactor
ASM IP HOLDING BV43 citations92
US9576790B2Feb 21, 2017
Deposition of boron and carbon containing materials
ASM IP HOLDING BV7 citations84
US11088002B2Aug 10, 2021
Substrate rack and a substrate processing system and method
ASM IP HOLDING BV7 citations82
US10741385B2Aug 11, 2020
Method and apparatus for filling a gap
ASM IP HOLDING BV1 citations73
US9837281B2Dec 5, 2017
Cyclic doped aluminum nitride deposition
ASM IP HOLDING BV2 citations73
US11532757B2Dec 20, 2022
Deposition of charge trapping layers
ASM IP HOLDING BV2 citations72
US11447861B2Sep 20, 2022
Sequential infiltration synthesis apparatus and a method of forming a patterned structure
ASM IP HOLDING BV4 citations72
US10343907B2Jul 9, 2019
Method and system for delivering hydrogen peroxide to a semiconductor processing chamber
ASM IP HOLDING BV3 citations72
US10460932B2Oct 29, 2019
Semiconductor device with amorphous silicon filled gaps and methods for forming
ASM IP HOLDING BV3 citations71
US11230766B2Jan 25, 2022
Substrate processing apparatus and method
ASM IP HOLDING BV3 citations70
US11898243B2Feb 13, 2024
Method of forming vanadium nitride-containing layer
ASM IP HOLDING BV2 citations69
US11501968B2Nov 15, 2022
Method for providing a semiconductor device with silicon filled gaps
ASM IP HOLDING BV4 citations66
US12525449B2Jan 13, 2026
Method and apparatus for filling a gap
ASM IP HOLDING BV0 citations62
US12410522B2Sep 9, 2025
Substrate processing apparatus and method for processing substrates
ASM IP HOLDING BV0 citations62
US12351902B2Jul 8, 2025
Methods and systems for delivery of vanadium compounds
ASM IP HOLDING BV0 citations62
US12077854B2Sep 3, 2024
Chemical vapor deposition furnace with a cleaning gas system to provide a cleaning gas
ASM IP HOLDING BV1 citations62
US12000042B2Jun 4, 2024
Sequential infiltration synthesis apparatus and a method of forming a patterned structure
ASM IP HOLDING BV0 citations62
US11990333B2May 21, 2024
Method and apparatus for filling a gap
ASM IP HOLDING BV0 citations62
US11887857B2Jan 30, 2024
Methods and systems for depositing a layer comprising vanadium, nitrogen, and a further element
ASM IP HOLDING BV0 citations62
US11851755B2Dec 26, 2023
Sequential infiltration synthesis apparatus and a method of forming a patterned structure
ASM IP HOLDING BV0 citations62
US11694892B2Jul 4, 2023
Method and apparatus for filling a gap
ASM IP HOLDING BV0 citations62
US11629407B2Apr 18, 2023
Substrate processing apparatus and method for processing substrates
ASM IP HOLDING BV1 citations62
US11610775B2Mar 21, 2023
Method and apparatus for filling a gap
ASM IP HOLDING BV0 citations62
US11107676B2Aug 31, 2021
Method and apparatus for filling a gap
ASM IP HOLDING BV0 citations62
US11056353B2Jul 6, 2021
Method and structure for wet etch utilizing etch protection layer comprising boron and carbon
ASM IP HOLDING BV0 citations62
US10199223B2Feb 5, 2019
Semiconductor device fabrication using etch stop layer
ASM IP HOLDING BV1 citations62
US12040229B2Jul 16, 2024
Method for forming a structure with a hole
ASM IP HOLDING BV0 citations61
US11996289B2May 28, 2024
Methods of forming structures including silicon germanium and silicon layers, devices formed using the methods, and systems for performing the methods
ASM IP HOLDING BV0 citations61
US11594450B2Feb 28, 2023
Method for forming a structure with a hole
ASM IP HOLDING BV1 citations61
US12448683B2Oct 21, 2025
Method of forming a vanadium nitride-containing layer
ASM IP HOLDING BV0 citations59
US11646204B2May 9, 2023
Method for forming a layer provided with silicon
ASM IP HOLDING BV0 citations59
US9799509B2Oct 24, 2017
Cyclic aluminum oxynitride deposition
ASM IP HOLDING BV0 citations52
US9711351B2Jul 18, 2017
Process for densifying nitride film
ASM IP HOLDING BV0 citations52
US9431238B2Aug 30, 2016
Reactive curing process for semiconductor substrates
ASM IP HOLDING BV1 citations51
US12387930B2Aug 12, 2025
Method and wafer processing furnace for forming an epitaxial stack of semiconductor epitaxial layers on a plurality of substrates
ASM IP HOLDING BV0 citations48
US12362174B2Jul 15, 2025
Method and wafer processing furnace for forming an epitaxial stack on a plurality of substrates
ASM IP HOLDING BV0 citations44
US10453685B2Oct 22, 2019
Forming semiconductor device by providing an amorphous silicon core with a hard mask layer
ASM IP HOLDING BV0 citations40
ASM INT NV
4 patentsUS10056249B2Aug 21, 2018
Atomic layer deposition of antimony oxide films
ASM INT NV4 citations82
US11549177B2Jan 10, 2023
Process for passivating dielectric films
ASM INT NV0 citations62
US9514934B2Dec 6, 2016
Atomic layer deposition of antimony oxide films
ASM INT NV1 citations61
US10699899B2Jun 30, 2020
Atomic layer deposition of antimony oxide films
ASM INT NV0 citations50