Substrate rack and a substrate processing system and method

Abstract

The invention relates to a substrate rack and a substrate processing system for processing substrates in a reaction chamber. The substrate rack may be used for introducing a plurality of substrates in the reaction chamber. The substrate rack may have a plurality of spaced apart substrate holding provisions configured to hold the substrates in a spaced apart relationship. The rack may have an illumination system to irradiate radiation with a range from 100 to 500 nanometers onto a top surface of the substrates.

What is claimed is: 
     
       1. A substrate rack comprising an illumination system, the substrate rack constructed for holding a plurality of substrates in a reaction chamber of a substrate processing system, the substrate rack comprising a plurality of spaced apart substrate holding provisions configured to hold the plurality of substrates and one or more removable illumination devices in a spaced apart relationship, wherein the one or more illumination devices are constructed and arranged to radiate ultraviolet radiation with a range from 100 to 500 nanometers onto a top surface of at least one of the substrates held in the substrate holding provisions, and wherein each illumination device is independently and removably supported by the substrate holding provisions to provide versatility in positioning the plurality of substrates and the one or more illumination devices;
 wherein the illumination system comprises a plurality of the illumination devices provided to the rack and each illumination device has dedicated substrate holding provisions on the rack to hold the top surface of one of the substrates in the radiation of the illumination device, wherein the dedicated substrate holding provisions are configured to hold the illumination devices about their perimeter. 
 
     
     
       2. The rack according to  claim 1 , wherein the dedicated substrate holding provisions on the rack are configured to hold one substrate about a perimeter of the one substrate and in between two illumination devices. 
     
     
       3. The rack according to  claim 1 , wherein the illumination device comprises a substantially plate shape with a top and a back surface and the back surface comprises a radiation output surface. 
     
     
       4. The rack according to  claim 1 , wherein the illumination device has substantially the same size as the substrate in directions parallel to the top surface. 
     
     
       5. The rack according to  claim 1 , wherein the illumination device is passive and is constructed and arranged to direct radiation from outside the rack to the substrates. 
     
     
       6. The rack according to  claim 1 , wherein the illumination system is constructed and arranged to direct the radiation in a direction within 0-45 degrees of an axis perpendicular to the top surface of the at least one of the substrates. 
     
     
       7. The rack according to  claim 1 , wherein the rack is provided with a gas supply system for providing a gas flow on a radiation transmitting or reflecting surface. 
     
     
       8. The rack according to  claim 1 , further comprising:
 between about 2 and about 4 struts extending along a length of the rack, wherein the substrate holding provisions are coupled to and spaced apart along the struts; 
 a top plate coupled to the struts; and 
 a bottom plate coupled to the struts. 
 
     
     
       9. The rack according to  claim 1 , wherein the substrate holding provisions of the rack are constructed and arranged to hold the top surface of the at least one of the substrates opposite a radiation output surface of the illumination system so as to radiate ultraviolet radiation onto the top surface of the at least one of the substrates. 
     
     
       10. The rack according to  claim 9 , wherein the illumination system comprises multiple parts to irradiate ultraviolet radiation to the substrates in the substrate rack from multiple sides. 
     
     
       11. The rack according to  claim 1 , wherein the illumination device comprises an optical wave guide to guide the radiation to the substrates. 
     
     
       12. The rack according to  claim 11  wherein the optical wave guide is an optical fiber. 
     
     
       13. The rack according to  claim 1 , wherein the rack is provided with an electrical power connection comprising a plug and socket interface between the illumination device and a power source to facilitate removal of the removable illumination device, wherein the illumination system is active and constructed and arranged to generate radiation from the electrical power and direct the radiation to the substrates. 
     
     
       14. The rack according to  claim 13 , wherein the illumination system comprises a discharge lamp. 
     
     
       15. The rack according to  claim 1 , wherein the illumination device is provided with illumination sources irradiating ultraviolet radiation onto the top surface of at least one of the substrates in the substrate rack. 
     
     
       16. The rack according to  claim 15 , wherein the illumination device comprises a first light emitting diode for irradiating ultraviolet radiation within a range from 100 to 500 nanometers. 
     
     
       17. The rack according to  claim 15 , wherein the illumination device comprises a second light emitting diode for irradiating infrared radiation within a range from 700 nanometers to 1 millimeter toward the top surface to heat the substrate. 
     
     
       18. The rack according to  claim 1 , wherein the illumination system is provided with radiation reflecting surfaces to direct the ultraviolet radiation to the substrates. 
     
     
       19. The rack according to  claim 18 , wherein the radiation reflecting surfaces comprises a material selected from the group of material comprising glass, or polytetrafluoroethylene (PTFE) to direct the radiation to the substrates. 
     
     
       20. The rack according to  claim 18 , wherein the radiation reflecting surfaces comprises a scatter plate to scatter the radiation to the substrates. 
     
     
       21. A substrate rack comprising an illumination system, the substrate rack constructed for holding a plurality of substrates in a reaction chamber of a substrate processing system, the substrate rack comprising a plurality of spaced apart substrate holding provisions configured to hold the plurality of substrates and one or more removable illumination devices in a spaced apart relationship, wherein the one or more illumination devices are constructed and arranged to radiate ultraviolet radiation with a range from 100 to 500 nanometers onto a top surface of at least one of the substrates held in the substrate holding provisions, and wherein each illumination device is independently and removably supported by the substrate holding provisions to provide versatility in positioning the plurality of substrates and the one or more illumination devices;
 wherein the rack is provided with an electrical power connection comprising a plug and socket interface between the illumination device and a power source to facilitate removal of the removable illumination device, wherein the illumination system is active and constructed and arranged to generate radiation from the electrical power and direct the radiation to the substrates. 
 
     
     
       22. The rack according to  claim 21 , wherein the illumination system comprises a discharge lamp. 
     
     
       23. The rack according to  claim 21 , wherein the illumination system comprises a plurality of the illumination devices provided to the rack and each illumination device has dedicated substrate holding provisions on the rack to hold the top surface of one of the substrates in the radiation of the illumination device, wherein the dedicated substrate holding provisions are configured to hold the illumination devices about their perimeter.