P

Inventor

SPREY HESSEL

BE15 patents
⚠️ This page may combine multiple inventors who share the name “SPREY HESSEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ASM INT

5 patents
US7419903B2Sep 2, 2008

Thin films

ASM INT88 citations98
US7981791B2Jul 19, 2011

Thin films

ASM INT10 citations84
US7884016B2Feb 8, 2011

Liner materials and related processes for 3-D integration

ASM INT13 citations83
US9006112B2Apr 14, 2015

Atomic layer deposition of antimony oxide films

ASM INT2 citations61
US6884317B2Apr 26, 2005

Method and installation for etching a substrate

ASM INT4 citations55

ASM INT NV

3 patents
US10056249B2Aug 21, 2018

Atomic layer deposition of antimony oxide films

ASM INT NV4 citations82
US9514934B2Dec 6, 2016

Atomic layer deposition of antimony oxide films

ASM INT NV1 citations61
US10699899B2Jun 30, 2020

Atomic layer deposition of antimony oxide films

ASM INT NV0 citations50

ASM IP HOLDING BV

2 patents
US9552979B2Jan 24, 2017

Cyclic aluminum nitride deposition in a batch reactor

ASM IP HOLDING BV43 citations92
US11088002B2Aug 10, 2021

Substrate rack and a substrate processing system and method

ASM IP HOLDING BV7 citations82

ASM MICROCHEMISTRY OY

1 patent
US6759325B2Jul 6, 2004

Sealing porous structures

ASM MICROCHEMISTRY OY169 citations98

ASM INC

1 patent
US7498242B2Mar 3, 2009

Plasma pre-treating surfaces for atomic layer deposition

ASM INC554 citations97

ASM INTERNAT NV

1 patent
US6878628B2Apr 12, 2005

In situ reduction of copper oxide prior to silicon carbide deposition

ASM INTERNAT NV159 citations96

IMEC VZW

1 patent
US6387827B1May 14, 2002

Method for growing thin silicon oxides on a silicon substrate using chlorine precursors

IMEC VZW348 citations95

STOKHOF MAARTEN

1 patent
US8652573B2Feb 18, 2014

Method of CVD-depositing a film having a substantially uniform film thickness

STOKHOF MAARTEN0 citations30