Inventor

JONGBLOED BERT

BE42 patents

⚠️ This page may combine multiple inventors who share the name “JONGBLOED BERT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

JONGBLOED BERT

ASM IP HOLDING BV

Method of forming a structure on a substrate

Method and apparatus for filling a gap

Method and apparatus for filling a gap

Cyclic aluminum nitride deposition in a batch reactor

Deposition of boron and carbon containing materials

Substrate rack and a substrate processing system and method

Atomic layer deposition apparatus

Method and apparatus for filling a gap

Modular vertical furnace processing system

Cyclic doped aluminum nitride deposition

Deposition of charge trapping layers

Sequential infiltration synthesis apparatus and a method of forming a patterned structure

Method and system for delivering hydrogen peroxide to a semiconductor processing chamber

Semiconductor device with amorphous silicon filled gaps and methods for forming

Substrate processing apparatus and method

Method of forming vanadium nitride-containing layer

Method for providing a semiconductor device with silicon filled gaps

Method and apparatus for filling a gap

Substrate processing apparatus and method for processing substrates

Methods and systems for delivery of vanadium compounds

Chemical vapor deposition furnace with a cleaning gas system to provide a cleaning gas

Sequential infiltration synthesis apparatus and a method of forming a patterned structure

Method and apparatus for filling a gap

Methods and systems for depositing a layer comprising vanadium, nitrogen, and a further element

Sequential infiltration synthesis apparatus and a method of forming a patterned structure

Method and apparatus for filling a gap

Substrate processing apparatus and method for processing substrates

Method and apparatus for filling a gap

Method and apparatus for filling a gap

Method and structure for wet etch utilizing etch protection layer comprising boron and carbon

Semiconductor device fabrication using etch stop layer

Method for forming a structure with a hole

Method for forming a structure with a hole

Method of forming a vanadium nitride-containing layer

Method for forming a layer provided with silicon

Cyclic aluminum oxynitride deposition

Process for densifying nitride film

Reactive curing process for semiconductor substrates

Method and wafer processing furnace for forming an epitaxial stack of semiconductor epitaxial layers on a plurality of substrates

Method and wafer processing furnace for forming an epitaxial stack on a plurality of substrates

Forming semiconductor device by providing an amorphous silicon core with a hard mask layer

STOKHOF MAARTEN

Method of CVD-depositing a film having a substantially uniform film thickness