P

Inventor

TSUCHIYA NORIHIKO

JP18 patents
⚠️ This page may combine multiple inventors who share the name “TSUCHIYA NORIHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOSHIBA KK

16 patents
US5738942AApr 14, 1998

Semiconductor silicon wafer and process for producing it

TOSHIBA KK73 citations95
US5534294AJul 9, 1996

Process for producing Semiconductor silicon wafer

TOSHIBA KK79 citations95
US5994756ANov 30, 1999

Substrate having shallow trench isolation

TOSHIBA KK56 citations94
US5071776ADec 10, 1991

Wafer processsing method for manufacturing wafers having contaminant-gettering damage on one surface

TOSHIBA KK74 citations93
US7057259B2Jun 6, 2006

Semiconductor wafer with ID mark, equipment for and method of manufacturing semiconductor device from them

TOSHIBA KK35 citations92
US6320655B1Nov 20, 2001

Defect-position identifying method for semiconductor substrate

TOSHIBA KK68 citations92
US5755877AMay 26, 1998

Method of growing thin film on semiconductor substrate and its manufacturing apparatus

TOSHIBA KK25 citations92
US5675176AOct 7, 1997

Semiconductor device and a method for manufacturing the same

TOSHIBA KK43 citations92
US7314766B2Jan 1, 2008

Semiconductor wafer treatment method, semiconductor wafer inspection method, semiconductor device development method and semiconductor wafer treatment apparatus

TOSHIBA KK9 citations83
US6963630B2Nov 8, 2005

Method for evaluating an SOI substrate, evaluation processor, and method for manufacturing a semiconductor device

TOSHIBA KK13 citations83
US6919260B1Jul 19, 2005

Method of manufacturing a substrate having shallow trench isolation

TOSHIBA KK16 citations82
US6146911ANov 14, 2000

Semiconductor wafer and method of manufacturing the same

TOSHIBA KK14 citations74
US5739575AApr 14, 1998

Dielectrically isolated substrate and method for manufacturing the same

TOSHIBA KK16 citations73
US5148457ASep 15, 1992

System for analyzing metal impurity on the surface of a single crystal semiconductor by using total reflection of x-rays fluorescence

TOSHIBA KK14 citations73
US7188049B2Mar 6, 2007

System and method for controlling manufacturing processes, and method for manufacturing a semiconductor device

TOSHIBA KK2 citations63
US7531462B2May 12, 2009

Method of inspecting semiconductor wafer

TOSHIBA KK0 citations41

KABUSHIKIA KAISHA TOSHIBA

1 patent

TOSHIBA MEMORY CORP

1 patent