Inventor · disambiguated record
Kazuki Nonomura
Also filed as: NONOMURA Kazuki
6 granted patents·6 pending applications·11 citations·filing 2016–2025
72Inventor score
Technology areasH10P
Top patents by PatentIndex Score
12 records- 0177US11020760B2Substrate processing apparatus and precursor gas nozzleHITACHI INT ELECTRIC INC·Filed 2017·Granted Jun 1, 2021·3 cites·10 claims
- 0276US2025327183A1Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2025·Application pending·0 cites
- 0371US2025293016A1Cleaning method, method of manufacturing semiconductor device, recording medium, and substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2025·Application pending·0 cites
- 0469US12354868B2Cleaning method, method of manufacturing semiconductor device, recording medium, and substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2022·Granted Jul 8, 2025·0 cites·18 claims
- 0566US12371788B2Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2021·Granted Jul 29, 2025·0 cites·12 claims
- 0659US2025043418A1Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2024·Application pending·0 cites
- 0758US2025201550A1Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2024·Application pending·0 cites
- 0856USD828091SGas supply nozzleHITACHI INT ELECTRIC INC·Filed 2016·Granted Sep 11, 2018·8 cites·1 claims
- 0955US12163226B2Substrate processing apparatus, reaction container, method of manufacturing semiconductor device, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2021·Granted Dec 10, 2024·0 cites·18 claims
- 1051US12249502B2Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2021·Granted Mar 11, 2025·0 cites·19 claims
- 1150US2025293022A1Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2025·Application pending·0 cites
- 1237US2018286725A1Substrate retrainer and substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2018·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →