Inventor · disambiguated record
Stephen Andrew Motika
Also filed as: MOTIKA STEPHEN A · MOTIKA STEPHEN ANDREW
12 granted patents·8 pending applications·1,302 citations·filing 1989–2009
94Inventor score
Top patents by PatentIndex Score
20 records- 0198US7357138B2Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materialsAIR PROD & CHEM·Filed 2003·Granted Apr 15, 2008·559 cites·14 claims
- 0297US7055263B2Method for cleaning deposition chambers for high dielectric constant materialsAIR PROD & CHEM·Filed 2003·Granted Jun 6, 2006·385 cites·21 claims
- 0393US5712220ACoompositions capable of operating under high carbon dioxide partial pressures for use in solid-state oxygen producing devicesAIR PROD & CHEM·Filed 1996·Granted Jan 27, 1998·72 cites·9 claims
- 0490US7581549B2Method for removing carbon-containing residues from a substrateAIR PROD & CHEM·Filed 2005·Granted Sep 1, 2009·18 cites·20 claims
- 0590US5817597ACompositions capable of operating under high oxygen partial pressures for use in solid-state oxygen producing devicesAIR PROD & CHEM·Filed 1996·Granted Oct 6, 1998·52 cites·7 claims
- 0687US7285154B2Xenon recovery systemAIR PROD & CHEM·Filed 2004·Granted Oct 23, 2007·42 cites·24 claims
- 0780US7122072B2Controlled heating and cooling of mixed conducting metal oxide materialsAIR PROD & CHEM·Filed 2003·Granted Oct 17, 2006·26 cites·33 claims
- 0880US5026676ACatalyst for the copolymerization of epoxides with CO2AIR PROD & CHEM·Filed 1990·Granted Jun 25, 1991·45 cites·11 claims
- 0979US4960862ARegeneration of metallo-organic catalyst for carbon dioxide-epoxide copolymerizationAIR PROD & CHEM·Filed 1989·Granted Oct 2, 1990·35 cites·14 claims
- 1078US6056807AFluid separation devices capable of operating under high carbon dioxide partial pressures which utilize creep-resistant solid-state membranes formed from a mixed conducting multicomponent metallic oxideAIR PROD & CHEM·Filed 1998·Granted May 2, 2000·52 cites·8 claims
- 1176US7119032B2Method to protect internal components of semiconductor processing equipment using layered superlattice materialsAIR PROD & CHEM·Filed 2004·Granted Oct 10, 2006·14 cites·19 claims
- 1263US8372756B2Selective etching of silicon dioxide compositionsAIR PROD & CHEM·Filed 2009·Granted Feb 12, 2013·2 cites·14 claims
- 1348US2007224829A1Use Of Hypofluorites, Fluoroperoxides, And/Or Fluorotrioxides As Oxidizing Agent In Fluorocarbon Etch PlasmasAIR PROD & CHEM·Filed 2007·Application pending·0 cites
- 1447US2009087796A1Cyclopentene As A Precursor For Carbon-Based FilmsAIR PROD & CHEM·Filed 2008·Application pending·0 cites
- 1545US2008047579A1Detecting the endpoint of a cleaning processJI BING·Filed 2006·Application pending·0 cites
- 1644US2006040054A1Passivating ALD reactor chamber internal surfaces to prevent residue buildupPEARLSTEIN RONALD M·Filed 2004·Application pending·0 cites
- 1742US2004011380A1Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materialsFiled 2003·Application pending·0 cites
- 1838US2005014383A1Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmasFiled 2003·Application pending·0 cites
- 1937US2004014327A1Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materialsFiled 2002·Application pending·0 cites
- 2035US2005011859A1Unsaturated oxygenated fluorocarbons for selective aniostropic etch applicationsFiled 2003·Application pending·0 cites
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