Inventor · disambiguated record
Klaus Gwosch
Also filed as: GWOSCH KLAUS
10 granted patents·6 pending applications·32 citations·filing 2018–2025
84Inventor score
Top patents by PatentIndex Score
16 records- 0195US11255791B2Method of and apparatus for spatially measuring nano-scale structuresMAX PLANCK GESELLSCHAFT·Filed 2020·Granted Feb 22, 2022·7 cites·20 claims
- 0292US10962479B2Method of high spatial resolution determining a position of a singularized molecule which is excitable for emission of luminescence lightMAX PLANCK GESELLSCHAFT·Filed 2019·Granted Mar 30, 2021·10 cites·29 claims
- 0391US10900901B2Method of high spatial resolution determining a position of a singularized molecule which is excitable for emission of luminescence lightMAX PLANCK GESELLSCHAFT·Filed 2019·Granted Jan 26, 2021·8 cites·23 claims
- 0490US10908089B2Method of high spatial resolution determining a position of a singularized molecule which is excitable for emission of luminescence lightMAX PLANCK GESELLSCHAFT·Filed 2019·Granted Feb 2, 2021·7 cites·23 claims
- 0571US2025314602A1Method for qualifying a defect structure on an object utilizable in projection lithographyZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 0666US11796926B2Metrology system for examining objects with EUV measurement lightZEISS CARL SMT GMBH·Filed 2022·Granted Oct 24, 2023·0 cites·20 claims
- 0766US2024402613A1Method for simulating illumination and imaging properties of an optical production system when illuminating and imaging an object by means of an optical measurement systemZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 0863US2024361704A1Method for simulating illumination and imaging properties of an optical production system during the illumination and imaging of an object by means of an optical measurement systemZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 0961US10794829B2Method of and apparatus for spatially measuring nano-scale structuresMAX PLANCK GESELLSCHAFT·Filed 2018·Granted Oct 6, 2020·0 cites·26 claims
- 1059US12422743B2Method for measuring a reflectivity of an object for measurement light and metrology system for carrying out the methodZEISS CARL SMT GMBH·Filed 2022·Granted Sep 23, 2025·0 cites·18 claims
- 1159US2024085783A1Optical device, method for adjusting a setpoint deformation and lithography systemZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1259US2024103381A1Optical apparatus, method for setting a target deformation, and lithography systemZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1358US2025334886A1Method for simulating illumination and imaging properties of an optical production system when an object is illuminated and imaged by means of an optical measurement systemZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1455US12158703B2Method for reproducing a target wavefront of an imaging optical production system, and metrology system for carrying out the methodZEISS CARL SMT GMBH·Filed 2022·Granted Dec 3, 2024·0 cites·20 claims
- 1554US12492963B2Method for determining an imaging quality of an optical system when illuminated by illumination light within an entrance pupil to be measuredZEISS CARL SMT GMBH·Filed 2022·Granted Dec 9, 2025·0 cites·20 claims
- 1653US12372431B2Method for determining an imaging quality of an optical system when illuminated by illumination light within a pupil to be measuredZEISS CARL SMT GMBH·Filed 2022·Granted Jul 29, 2025·0 cites·26 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →