Inventor · disambiguated record
Zhenxing Han
Also filed as: HAN ZHENXING
4 granted patents·11 pending applications·4 citations·filing 2016–2024
63Inventor score
Files withAPPLIED MATERIALS INC9IBM4MICRON TECHNOLOGY INC1SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG1
Top patents by PatentIndex Score
15 records- 0172US11210024B2Optimizing read-modify-write operations to a storage device by writing a copy of the write data to a shadow blockIBM·Filed 2019·Granted Dec 28, 2021·1 cites·20 claims
- 0272US2025028242A1Integrated solution with low temperature dry develop for euv photoresistAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0371US10191809B2Converting a data chunk into a ring algebraic structure for fast erasure codingIBM·Filed 2016·Granted Jan 29, 2019·2 cites·20 claims
- 0467US10657001B2Converting a data chunk into a ring algebraic structure for fast erasure codingIBM·Filed 2018·Granted May 19, 2020·1 cites·18 claims
- 0567US2024160100A1Integrated solution with low temperature dry develop for euv photoresistAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 0665US2025053086A1Post development treatment for metal-oxide photoresistsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0765US2024271276A1Multiple-metal-containing metal-oxo photoresist films by cvd and ald methodsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0863US2024319603A1Euv sensitive metal oxide material as underlayer for thin car to improve pattern transferAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0962US2024272552A1Preferential infiltration in lithographic process flow for euv car resistAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1060US2024427308A1Substrate process operation analysis application and generation of visualizationsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1154US2024074194A1Memory device including staircase structures and adjacent trench structuresMICRON TECHNOLOGY INC·Filed 2023·Application pending·0 cites
- 1253US2025062123A1Treatments for thin films used in photolithographyAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1352US2022342302A1Dual tone photoresistsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1447US11544387B2Hash protection within an object storage libraryIBM·Filed 2019·Granted Jan 3, 2023·0 cites·14 claims
- 1530US2017271145A1Method and an apparatus for cleaning substratesSUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG·Filed 2016·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →