Inventor · disambiguated record
Sung-Kee Han
Also filed as: HAN SUNG S · HAN SUNG-KEE
13 granted patents·11 pending applications·554 citations·filing 2005–2018
92Inventor score
Files withSAMSUNG ELECTRONICS CO LTD13JUNG HYUNG-SUK2KIM MIN-JOO2DONGBUANAM SEMICONDUCTOR INC1KIM JU-YOUN1
Top patents by PatentIndex Score
24 records- 0197US9508727B2Integrated circuit device and method of manufacturing the samePARK HONG-BAE·Filed 2015·Granted Nov 29, 2016·48 cites·23 claims
- 0295US10014304B2Integrated circuit device and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jul 3, 2018·10 cites·16 claims
- 0395US9337057B2Semiconductor device and method for fabricating the samePARK MOON-KYU·Filed 2015·Granted May 10, 2016·432 cites·20 claims
- 0493US9780183B2Semiconductor devices having work function metal films and tuning materialsKIM WAN-DON·Filed 2016·Granted Oct 3, 2017·12 cites·20 claims
- 0590US10312340B2Semiconductor devices having work function metal films and tuning materialsSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jun 4, 2019·6 cites·20 claims
- 0690US7952118B2Semiconductor device having different metal gate structuresSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted May 31, 2011·14 cites·8 claims
- 0788US7829953B2Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Nov 9, 2010·13 cites·11 claims
- 0886US8772146B2Semiconductor device and method for fabricating the sameKIM JU-YOUN·Filed 2012·Granted Jul 8, 2014·8 cites·9 claims
- 0981US10651179B2Integrated circuit device and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted May 12, 2020·2 cites·15 claims
- 1075US9059090B2Semiconductor device and method for fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jun 16, 2015·3 cites·10 claims
- 1174US7323419B2Method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jan 29, 2008·4 cites·21 claims
- 1259US9048307B2Method of manufacturing a semiconductor device having sequentially stacked high-k dielectric layersSONG JAE-YEOL·Filed 2012·Granted Jun 2, 2015·2 cites·15 claims
- 1347US2011193181A1Semiconductor device having different metal gate structuresSAMSUNG ELECTRONICS CO LTD·Filed 2011·Application pending·0 cites
- 1446US2007178634A1Cmos semiconductor devices having dual work function metal gate stacksJUNG HYUNG SUK·Filed 2006·Application pending·0 cites
- 1545US2008079086A1Semiconductor device and method of manufacturing the sameJUNG HYUNG-SUK·Filed 2007·Application pending·0 cites
- 1644US7767512B2Methods of manufacturing a semiconductor device including CMOS transistor having different PMOS and NMOS gate electrode structuresSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Aug 3, 2010·0 cites·12 claims
- 1742US2006156982A1Apparatus for fabricating semiconductor deviceDONGBUANAM SEMICONDUCTOR INC·Filed 2005·Application pending·0 cites
- 1841US2007178637A1Method of fabricating gate of semiconductor device using oxygen-free ashing processSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1939US2007178681A1Semiconductor device having a plurality of metal layers deposited thereonSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 2039US2007034966A1Dual gate CMOS semiconductor devices and methods of fabricating such devicesKIM MIN-JOO·Filed 2006·Application pending·0 cites
- 2138US2006157796A1Semiconductor device having dual gate electrode and related method of formationKIM MIN-JOO·Filed 2005·Application pending·0 cites
- 2238US2007152283A1Semiconductor device and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 2338US2006003534A1Salicide process using bi-metal layer and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 2436US2006223296A1Semiconductor device having self-aligned silicide layer and method thereofSUN MIN-CHUL·Filed 2005·Application pending·0 cites
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