Inventor

UENISHI KAZUYA

JP52 patents

⚠️ This page may combine multiple inventors who share the name “UENISHI KAZUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

UENISHI KAZUYA

FUJI PHOTO FILM CO LTD

Postive photoresist composition

Positive type 1,2-naphthoquinonediazide photoresist composition containing benzotriazole light absorbing agent

Waterless planographic printing plate and method of plate making using the same

Positive working photosensitive composition

Positive image forming composition

Negative resist composition

Positive-working electron beam or X-ray resist composition

Positive photosensitive composition

Positive working photosensitive composition

Positive type photoresist composition comprising polyaromatic hydroxy quinone diazide esters as the photosensitive ingredient

Positive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazide

Negative-working resist composition

Positive working photosensitive composition

Positive-working photosensitive composition

Positive photoresist composition

Negative type photoresist composition

Positive-working photoresist composition

Positive resist composition

Positive photoresist composition

Intermediate layer material composition for multilayer resist process and pattern formation process using the same

Positive resist composition

Positive-working photoresist composition

Positive-working o-quinone diazide photoresist composition

Radiation-sensitive composition

Positive photosensitive composition

Positive photosensitive composition

Positive quinone diazide photoresist composition containing select polyhydroxy additive

Positive-type photoresist composition

Positive photoresist composition utilizing O-quinonediazide and novolak resin

Positive-working photoresist composition

Micropattern-forming material having a low molecular weight novolak resin, a quinone diazide sulfonyl ester and a solvent

Negative resist composition

Intermediate layer composition for three-layer resist process and pattern formation method using the same

Positive resist composition

Photosensitive resin composition for far-ultraviolet exposure

Positive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalyst

Thin film analyzing method

YOKOHAMA RUBBER CO LTD

Modified diene based polymer

Conveyor belt rubber composition, method for producing conveyor belt rubber composition, conveyor belt, and belt conveyor

Modified butadiene polymer and rubber composition

Conveyor belt rubber composition, method for producing conveyor belt rubber composition, conveyor belt, and belt conveyor

Aromatic vinyl-diene copolymer, method for producing aromatic vinyl-diene copolymer, and rubber composition

Diene polymer, method for producing diene polymer, and rubber composition

Production method for aromatic vinyl-diene copolymer and production method for rubber composition

Modified diene based polymer

Method of manufacturing terminal-modified polymer

Method of manufacturing terminal-modified polymer

Polymer, method of producing polymer, and rubber composition

DAINIPPON INK & CHEMICALS

Soft polyurethane foam from hydroxyl urethane prepolymer and polyester ether polyol

HENKEL KGAA

1,3-oxathiolane-2-thione compounds