Inventor
HESS CHRISTOPHER
US121 patents
⚠️ This page may combine multiple inventors who share the name “HESS CHRISTOPHER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
PDF SOLUTIONS INC
45 patentsUS9496119B1Nov 15, 2016
E-beam inspection apparatus and method of using the same on various integrated circuit chips
PDF SOLUTIONS INC77 citations98
US6901564B2May 31, 2005
System and method for product yield prediction
PDF SOLUTIONS INC143 citations98
US6834375B1Dec 21, 2004
System and method for product yield prediction using a logic characterization vehicle
PDF SOLUTIONS INC246 citations98
US6449749B1Sep 10, 2002
System and method for product yield prediction
PDF SOLUTIONS INC202 citations98
US9870962B1Jan 16, 2018
Integrated circuit including NCEM-enabled, interlayer overlap-configured fill cells, with NCEM pads formed from at least three conductive stripes positioned between adjacent gates
PDF SOLUTIONS INC13 citations96
US7174521B2Feb 6, 2007
System and method for product yield prediction
PDF SOLUTIONS INC32 citations96
US7487474B2Feb 3, 2009
Designing an integrated circuit to improve yield using a variant design element
PDF SOLUTIONS INC182 citations95
US9805994B1Oct 31, 2017
Mesh-style NCEM pads, and process for making semiconductor dies, chips, and wafers using in-line measurements from such pads
PDF SOLUTIONS INC15 citations93
US9799575B2Oct 24, 2017
Integrated circuit containing DOEs of NCEM-enabled fill cells
PDF SOLUTIONS INC19 citations93
US9627370B1Apr 18, 2017
Integrated circuit containing standard logic cells and library-compatible, NCEM-enabled fill cells, including at least via-open-configured, GATE-short-configured, GATECNT-short-configured, and TS-short-configured, NCEM-enabled fill cells
PDF SOLUTIONS INC15 citations93
US7673262B2Mar 2, 2010
System and method for product yield prediction
PDF SOLUTIONS INC11 citations92
US7373625B2May 13, 2008
System and method for product yield prediction
PDF SOLUTIONS INC12 citations92
US7356800B2Apr 8, 2008
System and method for product yield prediction
PDF SOLUTIONS INC15 citations92
US6475871B1Nov 5, 2002
Passive multiplexor test structure for integrated circuit manufacturing
PDF SOLUTIONS INC32 citations92
US7902852B1Mar 8, 2011
High density test structure array to support addressable high accuracy 4-terminal measurements
PDF SOLUTIONS INC19 citations90
US7434197B1Oct 7, 2008
Method for improving mask layout and fabrication
PDF SOLUTIONS INC21 citations90
US10978438B1Apr 13, 2021
IC with test structures and E-beam pads embedded within a contiguous standard cell area
PDF SOLUTIONS INC9 citations86
US10593604B1Mar 17, 2020
Process for making semiconductor dies, chips, and wafers using in-line measurements obtained from DOEs of NCEM-enabled fill cells
PDF SOLUTIONS INC19 citations86
US10199283B1Feb 5, 2019
Method for processing a semiconductor wager using non-contact electrical measurements indicative of a resistance through a stitch, where such measurements are obtained by scanning a pad comprised of at least three parallel conductive stripes using a moving stage with beam deflection to account for motion of the stage
PDF SOLUTIONS INC3 citations84
US10199288B1Feb 5, 2019
Method for processing a semiconductor wafer using non-contact electrical measurements indicative of at least one side-to-side short or leakage, at least one corner short or leakage, and at least one via open or resistance, where such measurements are obtained from non-contact pads associated with respective side-to-side short, corner short, and via open test areas
PDF SOLUTIONS INC2 citations84
US9905487B1Feb 27, 2018
Process for making semiconductor dies, chips, and wafers using non-contact measurements obtained from DOEs of NCEM-enabled fill cells on test wafers that include multiple means/steps for enabling NC detection of V0 via opens
PDF SOLUTIONS INC3 citations84
US9786648B1Oct 10, 2017
Integrated circuit containing standard logic cells and library-compatible, NCEM-enabled fill cells, including at least chamfer-short-configured, AACNT-short-configured, GATECNT-short-configured, and TS-short-configured, NCEM-enabled fill cells
PDF SOLUTIONS INC2 citations84
US9773773B1Sep 26, 2017
Integrated circuit containing standard logic cells and library-compatible, NCEM-enabled fill cells, including at least chamfer-short-configured, AACNT-short-configured, GATE-short-configured, and GATECNT-short-configured, NCEM-enabled fill cells
PDF SOLUTIONS INC2 citations84
US9761575B1Sep 12, 2017
Integrated circuit containing standard logic cells and library-compatible, NCEM-enabled fill cells, including at least chamfer-short-configured, AACNT-short-configured, GATE-short-configured, and TS-short-configured, NCEM-enabled fill cells
PDF SOLUTIONS INC2 citations84
US9741703B1Aug 22, 2017
Integrated circuit containing standard logic cells and ilbrary-compatible, NCEM-enabled fill cells, including at least via-open-configured, gate-short-configured, TS-short-configured, and AA-short-conigured, NCEM-enabled fill cells
PDF SOLUTIONS INC4 citations84
US9691672B1Jun 27, 2017
Integrated circuit containing standard logic cells and library-compatible, NCEM-enabled fill cells, including at least via-open-configured, GATE-short-configured, GATECNT-short-configured, and metal-short-configured, NCEM-enabled fill cells
PDF SOLUTIONS INC4 citations84
US9627371B1Apr 18, 2017
Integrated circuit containing standard logic cells and library-compatible, NCEM-enabled fill cells, including at least via-open-configured, GATE-short-configured, GATECNT-short-configured, and AA-short-configured, NCEM-enabled fill cells
PDF SOLUTIONS INC7 citations84
US6787800B2Sep 7, 2004
Test vehicle with zig-zag structures
PDF SOLUTIONS INC18 citations84
US7197726B2Mar 27, 2007
Test structures for estimating dishing and erosion effects in copper damascene technology
PDF SOLUTIONS INC11 citations82
US7024642B2Apr 4, 2006
Extraction method of defect density and size distributions
PDF SOLUTIONS INC16 citations82
US8362480B1Jan 29, 2013
Reusable test chip for inline probing of three dimensionally arranged experiments
PDF SOLUTIONS INC10 citations76
US9947601B1Apr 17, 2018
Integrated circuit including NCEM-enabled, side-to-side gap-configured fill cells, with NCEM pads formed from at least three conductive stripes positioned between adjacent gates
PDF SOLUTIONS INC1 citations74
US9922968B1Mar 20, 2018
Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including side-to-side short configured fill cells, and the second DOE including chamfer short configured fill cells
PDF SOLUTIONS INC1 citations74
US9721937B1Aug 1, 2017
Integrated circuit containing first and second does of standard cell compatible, NCEM-enabled fill cells, with the first DOE including side-to-side short configured fill cells, and the second DOE including tip-to-tip short configured fill cells
PDF SOLUTIONS INC1 citations74
US10290552B1May 14, 2019
Methods for processing a semiconductor wafer using non-contact electrical measurements indicative of at least one tip-to-tip short or leakage, at least one via-chamfer short or leakage, and at least one corner short or leakage, where such measurements are obtained from cells with respective tip-to-tip short, via-chamfer short, and corner short test areas, using a charged particle-beam inspector with beam deflection to account for motion of the stage
PDF SOLUTIONS INC2 citations73
US10199294B1Feb 5, 2019
Method for processing a semiconductor wafer using non-contact electrical measurements indicative of a least one side-to-side short or leakage, at least one via-chamfer short or leakage, and at least one corner short or leakage, where such measurements are obtained from cells with respective side-to-side short, via-chamfer short, and corner short test areas, using a charged particle-beam inspector with beam deflection to account for motion of the stage
PDF SOLUTIONS INC1 citations73
US10096530B1Oct 9, 2018
Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including merged-via open configured fill cells, and the second DOE including stitch open configured fill cells
PDF SOLUTIONS INC4 citations73
US9929063B1Mar 27, 2018
Process for making an integrated circuit that includes NCEM-Enabled, tip-to-side gap-configured fill cells, with NCEM pads formed from at least three conductive stripes positioned between adjacent gates
PDF SOLUTIONS INC2 citations73
US9911649B1Mar 6, 2018
Process for making and using mesh-style NCEM pads
PDF SOLUTIONS INC2 citations73
US9773774B1Sep 26, 2017
Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including chamfer short configured fill cells, and the second DOE including corner short configured fill cells
PDF SOLUTIONS INC4 citations73
US9768083B1Sep 19, 2017
Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including merged-via open configured fill cells, and the second DOE including snake open configured fill cells
PDF SOLUTIONS INC2 citations73
US9761573B1Sep 12, 2017
Integrated circuit containing standard logic cells and library-compatible, NCEM-enabled fill cells, including at least via-open-configured, AACNT-short-configured, GATE-short-configured, and TS-short-configured, NCEM-enabled fill cells
PDF SOLUTIONS INC2 citations73
US9653446B1May 16, 2017
Integrated circuit containing standard logic cells and library-compatible, NCEM-enabled fill cells, including at least via-open-configured, AACNT-short-configured, TS-short-configured, and AA-short-configured, NCEM-enabled fill cells
PDF SOLUTIONS INC2 citations73
US10269786B1Apr 23, 2019
Integrated circuit containing first and second DOEs of standard Cell Compatible, NCEM-enabled Fill Cells, with the first DOE including tip-to-side short configured fill cells, and the second DOE including corner short configured fill cells
PDF SOLUTIONS INC0 citations63
US10199284B1Feb 5, 2019
Method for processing a semiconductor wafer using non-contact electrical measurements indicative of at least one tip-to-tip short or leakage, at least one tip-to-side short or leakage, and at least one chamfer short or leakage, where such measurements are obtained from non-contact pads associated with respective tip-to-tip short, tip-to-side short, and chamfer short test areas
PDF SOLUTIONS INC0 citations63
ACTION TARGET INC
3 patentsHESS CHRISTOPHER
1 patentUHDE INVENTA FISCHER GMBH
1 patentShowing the top 50 of 121 patents by PatentIndex Score.