Inventor
CODY NYLES WYNN
US33 patents
⚠️ This page may combine multiple inventors who share the name “CODY NYLES WYNN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ATOMERA INC
32 patentsUS10109479B1Oct 23, 2018
Method of making a semiconductor device with a buried insulating layer formed by annealing a superlattice
ATOMERA INC82 citations98
US10566191B1Feb 18, 2020
Semiconductor device including superlattice structures with reduced defect densities
ATOMERA INC51 citations95
US10811498B2Oct 20, 2020
Method for making superlattice structures with reduced defect densities
ATOMERA INC35 citations94
US10727049B2Jul 28, 2020
Method for making a semiconductor device including compound semiconductor materials and an impurity and point defect blocking superlattice
ATOMERA INC30 citations94
US10468245B2Nov 5, 2019
Semiconductor device including compound semiconductor materials and an impurity and point defect blocking superlattice
ATOMERA INC46 citations94
US11387325B2Jul 12, 2022
Vertical semiconductor device with enhanced contact structure and associated methods
ATOMERA INC12 citations93
US11075078B1Jul 27, 2021
Method for making a semiconductor device including a superlattice within a recessed etch
ATOMERA INC21 citations93
US10879356B2Dec 29, 2020
Method for making a semiconductor device including enhanced contact structures having a superlattice
ATOMERA INC21 citations93
US10777451B2Sep 15, 2020
Semiconductor device including enhanced contact structures having a superlattice
ATOMERA INC30 citations93
US11978771B2May 7, 2024
Gate-all-around (GAA) device including a superlattice
ATOMERA INC7 citations86
US11923418B2Mar 5, 2024
Semiconductor device including a superlattice and enriched silicon 28 epitaxial layer
ATOMERA INC7 citations86
US11848356B2Dec 19, 2023
Method for making semiconductor device including superlattice with oxygen and carbon monolayers
ATOMERA INC6 citations86
US11837634B2Dec 5, 2023
Semiconductor device including superlattice with oxygen and carbon monolayers
ATOMERA INC10 citations86
US11810784B2Nov 7, 2023
Method for making semiconductor device including a superlattice and enriched silicon 28 epitaxial layer
ATOMERA INC9 citations86
US11728385B2Aug 15, 2023
Semiconductor device including superlattice with O18 enriched monolayers
ATOMERA INC7 citations86
US11721546B2Aug 8, 2023
Method for making semiconductor device with selective etching of superlattice to accumulate non-semiconductor atoms
ATOMERA INC6 citations86
US11682712B2Jun 20, 2023
Method for making semiconductor device including superlattice with O18 enriched monolayers
ATOMERA INC7 citations86
US11631584B1Apr 18, 2023
Method for making semiconductor device with selective etching of superlattice to define etch stop layer
ATOMERA INC7 citations86
US11430869B2Aug 30, 2022
Method for making superlattice structures with reduced defect densities
ATOMERA INC8 citations86
US11302823B2Apr 12, 2022
Method for making semiconductor device including a superlattice with different non-semiconductor material monolayers
ATOMERA INC11 citations86
US11177351B2Nov 16, 2021
Semiconductor device including a superlattice with different non-semiconductor material monolayers
ATOMERA INC16 citations86
US11664427B2May 30, 2023
Vertical semiconductor device with enhanced contact structure and associated methods
ATOMERA INC7 citations85
US12046470B2Jul 23, 2024
Method for making semiconductor device including a superlattice and enriched silicon 28 epitaxial layer
ATOMERA INC1 citations73
US12477798B2Nov 18, 2025
Semiconductor device including a superlattice and enriched silicon 28 epitaxial layer
ATOMERA INC0 citations63
US12322594B2Jun 3, 2025
Method for making semiconductor device including a superlattice and enriched silicon 28 epitaxial layer
ATOMERA INC0 citations63
US12191160B2Jan 7, 2025
Method for making a semiconductor superlattices with different non-semiconductor thermal stabilities
ATOMERA INC0 citations63
US12142641B2Nov 12, 2024
Method for making gate-all-around (GAA) device including a superlattice
ATOMERA INC0 citations63
US12119380B2Oct 15, 2024
Method for making semiconductor device including superlattice with oxygen and carbon monolayers
ATOMERA INC0 citations63
US12575199B2Mar 10, 2026
Image sensor devices including a superlattice
ATOMERA INC0 citations62
US12315723B2May 27, 2025
Method for making semiconductor device with selective etching of superlattice to accumulate non-semiconductor atoms
ATOMERA INC0 citations62
US12199148B2Jan 14, 2025
Semiconductor device including superlattice with O18 enriched monolayers
ATOMERA INC0 citations62
US12315722B2May 27, 2025
Method for making a radio frequency silicon-on-insulator (RFSOI) wafer including a superlattice
ATOMERA INC0 citations50