Inventor
NIEDERNOSTHEIDE FRANZ JOSEF
DE123 patents
⚠️ This page may combine multiple inventors who share the name “NIEDERNOSTHEIDE FRANZ JOSEF”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INFINEON TECHNOLOGIES AG
32 patentsUS7514750B2Apr 7, 2009
Semiconductor device and fabrication method suitable therefor
INFINEON TECHNOLOGIES AG22 citations92
US7361970B2Apr 22, 2008
Method for production of a buried stop zone in a semiconductor component and semiconductor component comprising a buried stop zone
INFINEON TECHNOLOGIES AG21 citations92
US11876509B1Jan 16, 2024
Gate control method of MOS-gated power device
INFINEON TECHNOLOGIES AG6 citations85
US10326009B2Jun 18, 2019
Power semiconductor transistor having fully depleted channel region
INFINEON TECHNOLOGIES AG5 citations84
US10141404B2Nov 27, 2018
Power semiconductor device having fully depleted channel region
INFINEON TECHNOLOGIES AG6 citations84
US9859408B2Jan 2, 2018
Power semiconductor transistor having fully depleted channel region
INFINEON TECHNOLOGIES AG6 citations84
US9166027B2Oct 20, 2015
IGBT with reduced feedback capacitance
INFINEON TECHNOLOGIES AG6 citations84
US9054035B2Jun 9, 2015
Increasing the doping efficiency during proton irradiation
INFINEON TECHNOLOGIES AG8 citations84
US8367532B2Feb 5, 2013
Semiconductor device and fabrication method
INFINEON TECHNOLOGIES AG5 citations84
US12088283B2Sep 10, 2024
Actively tracking switching speed control and regulating switching speed of a power transistor during turn-on
INFINEON TECHNOLOGIES AG4 citations74
US7675108B2Mar 9, 2010
Method for producing a buried N-doped semiconductor zone in a semiconductor body and semiconductor component
INFINEON TECHNOLOGIES AG7 citations74
US7667297B2Feb 23, 2010
Method for producing a stop zone in a semiconductor body and semiconductor component having a stop zone
INFINEON TECHNOLOGIES AG5 citations74
US10665706B2May 26, 2020
Power semiconductor transistor
INFINEON TECHNOLOGIES AG2 citations73
US10340336B2Jul 2, 2019
Power semiconductor device having fully depleted channel regions
INFINEON TECHNOLOGIES AG2 citations73
US10224206B2Mar 5, 2019
Bipolar transistor device with an emitter having two types of emitter regions
INFINEON TECHNOLOGIES AG2 citations73
US10134835B2Nov 20, 2018
Power semiconductor device having fully depleted channel regions
INFINEON TECHNOLOGIES AG5 citations73
US9917181B2Mar 13, 2018
Bipolar transistor with superjunction structure
INFINEON TECHNOLOGIES AG3 citations73
US9882038B2Jan 30, 2018
Method of manufacturing a bipolar semiconductor switch
INFINEON TECHNOLOGIES AG2 citations73
US9627517B2Apr 18, 2017
Bipolar semiconductor switch and a manufacturing method therefor
INFINEON TECHNOLOGIES AG2 citations73
US7884389B2Feb 8, 2011
Bipolar power semiconductor component comprising a p-type emitter and more highly doped zones in the p-type emitter, and production method
INFINEON TECHNOLOGIES AG5 citations73
US11595035B1Feb 28, 2023
Method for reducing oscillation during turn on of a power transistor by regulating the gate switching speed control of its complementary power transistor
INFINEON TECHNOLOGIES AG3 citations72
US11444613B1Sep 13, 2022
Actively tracking switching speed control and regulating switching speed of a power transistor during turn-on
INFINEON TECHNOLOGIES AG5 citations72
US11031929B1Jun 8, 2021
Actively tracking switching speed control of a power transistor
INFINEON TECHNOLOGIES AG6 citations72
US10957764B2Mar 23, 2021
Vertical semiconductor device
INFINEON TECHNOLOGIES AG2 citations72
US9373710B2Jun 21, 2016
Insulated gate bipolar transistor
INFINEON TECHNOLOGIES AG4 citations72
US9525029B2Dec 20, 2016
Insulated gate bipolar transistor device, semiconductor device and method for forming said devices
INFINEON TECHNOLOGIES AG3 citations71
US12525971B2Jan 13, 2026
Gate control method of MOS-gated power device
INFINEON TECHNOLOGIES AG1 citations63
US7812368B2Oct 12, 2010
High speed diode
INFINEON TECHNOLOGIES AG3 citations63
US7749876B2Jul 6, 2010
Method for the production of a buried stop zone in a semiconductor component and semiconductor component comprising a buried stop zone
INFINEON TECHNOLOGIES AG4 citations63
US7195994B2Mar 27, 2007
Method for production of deep p regions in silicon, and semiconductor components produced using the method
INFINEON TECHNOLOGIES AG6 citations63
US6489187B2Dec 3, 2002
Method for setting the breakover voltage of a thyristor
INFINEON TECHNOLOGIES AG3 citations63
US12382677B2Aug 5, 2025
Power semiconductor device having nanometer-scale structure
INFINEON TECHNOLOGIES AG0 citations62
INFINEON TECHNOLOGIES AUSTRIA
6 patentsUS7538412B2May 26, 2009
Semiconductor device with a field stop zone
INFINEON TECHNOLOGIES AUSTRIA144 citations98
US7842590B2Nov 30, 2010
Method for manufacturing a semiconductor substrate including laser annealing
INFINEON TECHNOLOGIES AUSTRIA23 citations92
US9209292B2Dec 8, 2015
Charge compensation semiconductor devices
INFINEON TECHNOLOGIES AUSTRIA5 citations84
US7989888B2Aug 2, 2011
Semiconductor device with a field stop zone and process of producing the same
INFINEON TECHNOLOGIES AUSTRIA13 citations84
US8003502B2Aug 23, 2011
Semiconductor device and fabrication method
INFINEON TECHNOLOGIES AUSTRIA4 citations74
US7649244B2Jan 19, 2010
Vertical semiconductor device having semiconductor zones for improved operability under dynamic processes
INFINEON TECHNOLOGIES AUSTRIA3 citations63
SCHULZE HANS-JOACHIM
3 patentsUS8587025B1Nov 19, 2013
Method for forming laterally varying doping concentrations and a semiconductor device
SCHULZE HANS-JOACHIM10 citations82
US8829562B2Sep 9, 2014
Semiconductor device including a dielectric structure in a trench
SCHULZE HANS-JOACHIM5 citations73
US8101506B2Jan 24, 2012
Method for producing a buried n-doped semiconductor zone in a semiconductor body and semiconductor component
SCHULZE HANS-JOACHIM3 citations63
INFINEON TECHNOLOGIES AUSTRIA AG
3 patentsUS10461739B2Oct 29, 2019
Transistor device
INFINEON TECHNOLOGIES AUSTRIA AG4 citations73
US9947741B2Apr 17, 2018
Field-effect semiconductor device having pillar regions of different conductivity type arranged in an active area
INFINEON TECHNOLOGIES AUSTRIA AG4 citations73
US9570607B2Feb 14, 2017
Field-effect semiconductor device having alternating n-type and p-type pillar regions arranged in an active area
INFINEON TECHNOLOGIES AUSTRIA AG2 citations73
SIEMENS AG
2 patentsMAUDER ANTON
1 patentPFIRSCH FRANK
1 patentSCHULZE HANS JOACHIM
1 patentNIEDERNOSTHEIDE FRANZ JOSEF
1 patentShowing the top 50 of 123 patents by PatentIndex Score.