Inventor
IWAHASHI YASUTOMI
JP15 patents
⚠️ This page may combine multiple inventors who share the name “IWAHASHI YASUTOMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASAHI GLASS CO LTD
10 patentsUS7538052B2May 26, 2009
Silica glass containing TiO2 and process for its production
ASAHI GLASS CO LTD23 citations92
US7462574B2Dec 9, 2008
Silica glass containing TiO2 and optical material for EUV lithography
ASAHI GLASS CO LTD25 citations92
US7429546B2Sep 30, 2008
Silica glass containing TiO2 and process for its production
ASAHI GLASS CO LTD29 citations92
US7419924B2Sep 2, 2008
Silica glass containing TiO2 and process for its production
ASAHI GLASS CO LTD21 citations92
US7410922B2Aug 12, 2008
Silica glass containing TiO2 and process for its production
ASAHI GLASS CO LTD23 citations92
US7294595B2Nov 13, 2007
Silica glass
ASAHI GLASS CO LTD28 citations92
US7989378B2Aug 2, 2011
TiO2-containing silica glass
ASAHI GLASS CO LTD15 citations84
US8034731B2Oct 11, 2011
TIO2-containing silica glass and optical member for lithography using the same
ASAHI GLASS CO LTD5 citations62
US7998892B2Aug 16, 2011
TiO2-containing silica glass and optical member for lithography using the same
ASAHI GLASS CO LTD3 citations62
US8356494B2Jan 22, 2013
Process for producing porous quartz glass object, and optical member for EUV lithography
ASAHI GLASS CO LTD2 citations61
KOIKE AKIO
3 patentsUS8093165B2Jan 10, 2012
TiO2-containing silica glass and optical member for EUV lithography using the same
KOIKE AKIO8 citations82
US8590342B2Nov 26, 2013
Method for producing TiO2-SiO2 glass body, method for heat-treating TiO2-SiO2 glass body, TiO2-SiO2 glass body, and optical base for EUVL
KOIKE AKIO4 citations59
US8178450B2May 15, 2012
TiO2-containing silica glass and optical member for EUV lithography using high energy densities as well as special temperature controlled process for its manufacture
KOIKE AKIO0 citations47