Silica glass

Abstract

A silica glass containing from 3 to 10 mass % of TiO 2 , which has a coefficient of thermal expansion from 0 to 100° C., i.e. CTE 0 to 100 , of 0±300 ppb/° C. and an internal transmittance per mm in thickness within a wavelength region of from 200 to 700 nm, i.e. T 200 to 700 , of at most 80%.

1. A silica glass comprising from 3 to 10 mass % of TiO 2 , wherein the silica glass has
 a coefficient of thermal expansion from 0 to 100° C. of 0±300 ppb/°C., and 
 an internal transmittance per mm in thickness within a wavelength region of from 200 to 700 nm of at most 80%. 
 
     
     
       2. The silica glass according to  claim 1 , comprising a reducing agent for TiO 2  wherein the reducing agent is a halogen or carbon. 
     
     
       3. The silica glass according to  claim 1 , which has an internal transmittance per mm in thickness within a wavelength region of from 200 to 3,000 nm of at most 90%. 
     
     
       4. The silica glass according to  claim 1 , further comprising F. 
     
     
       5. The silica glass according to  claim 1 , wherein the internal transmittance per mm in thickness within a wavelength region of from 200 to 700 nm is at most 50%. 
     
     
       6. The silica glass according to  claim 5 , wherein the internal transmittance per mm in thickness within a wavelength region of from 200 to 700 nm is at most 20%. 
     
     
       7. The silica glass according to  claim 3 , wherein the internal transmittance per mm in thickness within a wavelength region of from 200 to 3,000 nm is at most 50%. 
     
     
       8. The silica glass according to  claim 7 , wherein the internal transmittance per mm in thickness within a wavelength region of from 200 to 3,000 nm is at most 20%. 
     
     
       9. The silica glass according to  claim 1 , wherein the internal transmittance per mm in thickness within a wavelength region of from 200 to 1,500 nm is at most 90%. 
     
     
       10. The silica glass according to  claim 9 , wherein the internal transmittance per mm in thickness within a wavelength region of from 200 to 1,500 nm is at most 50%. 
     
     
       11. The silica glass according to  claim 10 , wherein the internal transmittance per mm in thickness within a wavelength region of from 200 to 1,500 nm is at most 20%. 
     
     
       12. The silica glass according to  claim 4 , wherein the F content is at least 100 ppm. 
     
     
       13. The silica glass according to  claim 12 , wherein the F content is at least 2,000 ppm. 
     
     
       14. The silica glass according to  claim 13 , wherein the F content is at least 5,000 ppm. 
     
     
       15. The silica glass according to  claim 1 , wherein the mass % of TiO 2  is 5 to 9%. 
     
     
       16. The silica glass according to  claim 1 , further comprising at least one selected from the group consisting of Zr, V, Nb, Cr, Mo, Mn, Fe, Cu and Ce. 
     
     
       17. The silica glass according to  claim 4 , further comprising at least one selected from the group consisting of Zr, V, Nb, Cr, Mo, Mn, Fe, Cu and Ce. 
     
     
       18. An infrared heating apparatus comprising the silica glass according to  claim 1 . 
     
     
       19. A cell for optical analysis comprising the silica glass according to  claim 1 . 
     
     
       20. A base material for an extreme ultraviolet light exposure device comprising the silica glass according to  claim 1 .