Inventor
ACKMANN PAUL
US27 patents
⚠️ This page may combine multiple inventors who share the name “ACKMANN PAUL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
GLOBALFOUNDRIES INC
18 patentsUS8907496B1Dec 9, 2014
Circuit structures and methods of fabrication with enhanced contact via electrical connection
GLOBALFOUNDRIES INC4 citations72
US10923388B2Feb 16, 2021
Gap fill void and connection structures
GLOBALFOUNDRIES INC1 citations62
US10002827B2Jun 19, 2018
Method for selective re-routing of selected areas in a target layer and in adjacent interconnecting layers of an IC device
GLOBALFOUNDRIES INC1 citations51
US9672313B2Jun 6, 2017
Method for selective re-routing of selected areas in a target layer and in adjacent interconnecting layers of an IC device
GLOBALFOUNDRIES INC0 citations51
US9236301B2Jan 12, 2016
Customized alleviation of stresses generated by through-substrate via(S)
GLOBALFOUNDRIES INC1 citations51
US9368453B2Jun 14, 2016
Overlay mark dependent dummy fill to mitigate gate height variation
GLOBALFOUNDRIES INC1 citations50
US9252061B2Feb 2, 2016
Overlay mark dependent dummy fill to mitigate gate height variation
GLOBALFOUNDRIES INC0 citations50
US9864831B2Jan 9, 2018
Metrology pattern layout and method of use thereof
GLOBALFOUNDRIES INC0 citations49
US9817940B2Nov 14, 2017
Method wherein test cells and dummy cells are included into a layout of an integrated circuit
GLOBALFOUNDRIES INC0 citations49
US9672312B2Jun 6, 2017
Method wherein test cells and dummy cells are included into a layout of an integrated circuit
GLOBALFOUNDRIES INC0 citations49
US9535319B2Jan 3, 2017
Reticle, system comprising a plurality of reticles and method for the formation thereof
GLOBALFOUNDRIES INC1 citations49
US9323882B2Apr 26, 2016
Metrology pattern layout and method of use thereof
GLOBALFOUNDRIES INC0 citations49
US9250538B2Feb 2, 2016
Efficient optical proximity correction repair flow method and apparatus
GLOBALFOUNDRIES INC1 citations49
US9658531B2May 23, 2017
Semiconductor device resolution enhancement by etching multiple sides of a mask
GLOBALFOUNDRIES INC0 citations48
US8895211B2Nov 25, 2014
Semiconductor device resolution enhancement by etching multiple sides of a mask
GLOBALFOUNDRIES INC0 citations48
US9136223B2Sep 15, 2015
Forming alignment mark and resulting mark
GLOBALFOUNDRIES INC0 citations47
US9645486B2May 9, 2017
Multiple threshold convergent OPC model
GLOBALFOUNDRIES INC0 citations40
US9384318B2Jul 5, 2016
Mask error compensation by optical modeling calibration
GLOBALFOUNDRIES INC0 citations40
ADVANCED MICRO DEVICES INC
3 patentsUS6405144B1Jun 11, 2002
Method and apparatus for programmed latency for improving wafer-to-wafer uniformity
ADVANCED MICRO DEVICES INC62 citations95
US5757673AMay 26, 1998
Automated data management system for analysis and control of photolithography stepper performance
ADVANCED MICRO DEVICES INC53 citations93
US5586059ADec 17, 1996
Automated data management system for analysis and control of photolithography stepper performance
ADVANCED MICRO DEVICES INC40 citations89
GLOBALFOUNDRIES SG PTE LTD
3 patentsUS9500945B1Nov 22, 2016
Pattern classification based proximity corrections for reticle fabrication
GLOBALFOUNDRIES SG PTE LTD9 citations82
US9791772B2Oct 17, 2017
Monitoring pattern for devices
GLOBALFOUNDRIES SG PTE LTD0 citations51
US9798238B2Oct 24, 2017
Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques
GLOBALFOUNDRIES SG PTE LTD0 citations49