P

Inventor

HSU HSIN-YUN

TW21 patents
⚠️ This page may combine multiple inventors who share the name “HSU HSIN-YUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

14 patents
US10790142B2Sep 29, 2020

Selective capping processes and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations83
US10770288B2Sep 8, 2020

Selective capping processes and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD9 citations83
US11024505B2Jun 1, 2021

Gate structure passivating species drive-in method and structure formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations82
US10854459B2Dec 1, 2020

Gate structure passivating species drive-in method and structure formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations82
US11380542B2Jul 5, 2022

Selective capping processes and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US11710638B2Jul 25, 2023

Gate structure passivating species drive-in method and structure formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US12278288B2Apr 15, 2025

Fin field-effect transistor device having hybrid work function layer stack

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12051753B2Jul 30, 2024

Fin field-effect transistor device having hybrid work function layer stack

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12021145B2Jun 25, 2024

Fin field-effect transistor device having hybrid work function layer stack

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11830742B2Nov 28, 2023

Selective capping processes and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11380793B2Jul 5, 2022

Fin field-effect transistor device having hybrid work function layer stack

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12354876B2Jul 8, 2025

Gate structure passivating species drive-in method and structure formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11201227B2Dec 14, 2021

Gate structure with barrier layer and method for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US11145747B2Oct 12, 2021

FinFET structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51

IND TECH RES INST

6 patents

NIPPON ELECTRIC GLASS CO

1 patent