Inventor

KOMINE NOBUHIRO

JP31 patents

⚠️ This page may combine multiple inventors who share the name “KOMINE NOBUHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOMINE NOBUHIRO

TOSHIBA KK

Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unit

Reticle, exposure monitoring method, exposure method and manufacturing method for semiconductor device

Imprint apparatus, imprint method, and manufacturing method of semiconductor device

Method of focus measurement, exposure apparatus, and method of manufacturing semiconductor device

Measurement mark, method for measurement, and measurement apparatus

Photomask, photomask superimposition correcting method, and manufacturing method of semiconductor device

Apparatus for correcting a plurality of exposure tools, method for correcting a plurality of exposure tools, and method for manufacturing semiconductor device

Deflection measuring device and deflection measuring method

Pattern formation method and pattern formation apparatus

Exposure apparatus inspection mask and exposure apparatus inspection method

Reticle mark arrangement method and nontransitory computer readable medium storing a reticle mark arrangement program

Exposure processing system, exposure processing method and method for manufacturing a semiconductor device

Exposure method and method of manufacturing semiconductor device

Light exposure condition analysis method, nontransitory computer readable medium storing a light exposure condition analysis program, and manufacturing method for a semiconductor device

Mask processing apparatus and mask processing method

Mask set, fabrication method of mask set, manufacturing method of semiconductor device, and recording medium

Adjusting method of pattern transferring plate, laser application machine and pattern transferring plate

Overlay displacement amount measuring method, positional displacement amount measuring method and positional displacement amount measuring apparatus

Exposure apparatus and transfer characteristics measuring method

Method for controlling exposure apparatus and exposure apparatus

TOSHIBA MEMORY CORP

Positional deviation measuring device, non-transitory computer-readable recording medium containing a positional deviation measuring program, and method of manufacturing semiconductor device

Substrate measurement system, method of measuring substrate, and computer program product

Mask manufacturing method and mask set

Imprint apparatus and manufacturing method of semiconductor device

Imprint device and pattern forming method

Exposure method, exposure system, and manufacturing method for semiconductor device

Mask alignment mark, photomask, exposure apparatus, exposure method, and manufacturing method of device

Method of forming mark pattern, recording medium and method of generating mark data

Pattern shape adjustment method, pattern shape adjustment system, exposure apparatus, and recording medium

Wafer lithography equipment

SUZUKI MASARU

Reflective mask