Inventor
KAWAMURA KOHEI
JP44 patents
⚠️ This page may combine multiple inventors who share the name “KAWAMURA KOHEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
21 patentsUS5531834AJul 2, 1996
Plasma film forming method and apparatus and plasma processing apparatus
TOKYO ELECTRON LTD161 citations98
US5522934AJun 4, 1996
Plasma processing apparatus using vertical gas inlets one on top of another
TOKYO ELECTRON LTD322 citations98
US5290609AMar 1, 1994
Method of forming dielectric film for semiconductor devices
TOKYO ELECTRON LTD123 citations98
US5476182ADec 19, 1995
Etching apparatus and method therefor
TOKYO ELECTRON LTD66 citations96
US5083061AJan 21, 1992
Electron beam excited ion source
TOKYO ELECTRON LTD67 citations96
US6155200ADec 5, 2000
ECR plasma generator and an ECR system using the generator
TOKYO ELECTRON LTD45 citations93
US5308791AMay 3, 1994
Method and apparatus for processing surface of semiconductor layer
TOKYO ELECTRON LTD21 citations93
US6949829B2Sep 27, 2005
Semiconductor device and fabrication method therefor
TOKYO ELECTRON LTD22 citations92
US5252892AOct 12, 1993
Plasma processing apparatus
TOKYO ELECTRON LTD30 citations92
US5101110AMar 31, 1992
Ion generator
TOKYO ELECTRON LTD33 citations92
US5089747AFeb 18, 1992
Electron beam excitation ion source
TOKYO ELECTRON LTD22 citations92
US5028791AJul 2, 1991
Electron beam excitation ion source
TOKYO ELECTRON LTD44 citations92
US7897205B2Mar 1, 2011
Film forming method and film forming apparatus
TOKYO ELECTRON LTD7 citations84
US7717061B2May 18, 2010
Gas switching mechanism for plasma processing apparatus
TOKYO ELECTRON LTD20 citations84
US7776736B2Aug 17, 2010
Substrate for electronic device capable of suppressing fluorine atoms exposed at the surface of insulating film from reacting with water and method for processing same
TOKYO ELECTRON LTD3 citations63
US10388557B2Aug 20, 2019
Placing bed structure, treating apparatus using the structure, and method for using the apparatus
TOKYO ELECTRON LTD1 citations62
US7601402B2Oct 13, 2009
Method for forming insulation film and apparatus for forming insulation film
TOKYO ELECTRON LTD2 citations62
US8021975B2Sep 20, 2011
Plasma processing method for forming a film and an electronic component manufactured by the method
TOKYO ELECTRON LTD0 citations51
US9640388B2May 2, 2017
Method for forming insulating film and method for manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations46
US7307019B2Dec 11, 2007
Method for supercritical carbon dioxide processing of fluoro-carbon films
TOKYO ELECTRON LTD1 citations46
US8017197B2Sep 13, 2011
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations42
HITACHI HIGH TECH CORP
6 patentsUSD900760SNov 3, 2020
Ion shield plate for semiconductor manufacturing apparatus
HITACHI HIGH TECH CORP26 citations93
USD901407SNov 10, 2020
Integrated type ion shield for semiconductor manufacturing apparatus
HITACHI HIGH TECH CORP9 citations83
US11217454B2Jan 4, 2022
Plasma processing method and etching apparatus
HITACHI HIGH TECH CORP2 citations72
US11515167B2Nov 29, 2022
Plasma etching method and plasma processing apparatus
HITACHI HIGH TECH CORP1 citations62
US10872779B2Dec 22, 2020
Plasma etching method and plasma etching apparatus
HITACHI HIGH TECH CORP1 citations59
US10418254B2Sep 17, 2019
Etching method and etching apparatus
HITACHI HIGH TECH CORP0 citations52
KANEKA CORP
4 patentsUS12102151B2Oct 1, 2024
Fiber for artificial hair and hair ornament product including same
KANEKA CORP0 citations46
US9315922B2Apr 19, 2016
Polyester-based fiber for artificial hair and hair ornament product including the same
KANEKA CORP0 citations46
US7612000B2Nov 3, 2009
Modacrylic shrinkable fiber and method for manufacturing the same
KANEKA CORP1 citations45
US9560891B2Feb 7, 2017
Polyester-based fiber for artificial hair and hair ornament product including the same, and method for producing the same
KANEKA CORP0 citations35
KAWAMURA KOHEI
3 patentsUS8711265B2Apr 29, 2014
Image processing apparatus, control method for the same, and storage medium
KAWAMURA KOHEI18 citations82
US9177846B2Nov 3, 2015
Placing bed structure, treating apparatus using the structure, and method for using the apparatus
KAWAMURA KOHEI5 citations71
US8124523B2Feb 28, 2012
Fabrication method of a semiconductor device and a semiconductor device
KAWAMURA KOHEI0 citations51