P

Inventor

KAWAMURA KOHEI

JP44 patents
⚠️ This page may combine multiple inventors who share the name “KAWAMURA KOHEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

21 patents
US5531834AJul 2, 1996

Plasma film forming method and apparatus and plasma processing apparatus

TOKYO ELECTRON LTD161 citations98
US5522934AJun 4, 1996

Plasma processing apparatus using vertical gas inlets one on top of another

TOKYO ELECTRON LTD322 citations98
US5290609AMar 1, 1994

Method of forming dielectric film for semiconductor devices

TOKYO ELECTRON LTD123 citations98
US5476182ADec 19, 1995

Etching apparatus and method therefor

TOKYO ELECTRON LTD66 citations96
US5083061AJan 21, 1992

Electron beam excited ion source

TOKYO ELECTRON LTD67 citations96
US6155200ADec 5, 2000

ECR plasma generator and an ECR system using the generator

TOKYO ELECTRON LTD45 citations93
US5308791AMay 3, 1994

Method and apparatus for processing surface of semiconductor layer

TOKYO ELECTRON LTD21 citations93
US6949829B2Sep 27, 2005

Semiconductor device and fabrication method therefor

TOKYO ELECTRON LTD22 citations92
US5252892AOct 12, 1993

Plasma processing apparatus

TOKYO ELECTRON LTD30 citations92
US5101110AMar 31, 1992

Ion generator

TOKYO ELECTRON LTD33 citations92
US5089747AFeb 18, 1992

Electron beam excitation ion source

TOKYO ELECTRON LTD22 citations92
US5028791AJul 2, 1991

Electron beam excitation ion source

TOKYO ELECTRON LTD44 citations92
US7897205B2Mar 1, 2011

Film forming method and film forming apparatus

TOKYO ELECTRON LTD7 citations84
US7717061B2May 18, 2010

Gas switching mechanism for plasma processing apparatus

TOKYO ELECTRON LTD20 citations84
US7776736B2Aug 17, 2010

Substrate for electronic device capable of suppressing fluorine atoms exposed at the surface of insulating film from reacting with water and method for processing same

TOKYO ELECTRON LTD3 citations63
US10388557B2Aug 20, 2019

Placing bed structure, treating apparatus using the structure, and method for using the apparatus

TOKYO ELECTRON LTD1 citations62
US7601402B2Oct 13, 2009

Method for forming insulation film and apparatus for forming insulation film

TOKYO ELECTRON LTD2 citations62
US8021975B2Sep 20, 2011

Plasma processing method for forming a film and an electronic component manufactured by the method

TOKYO ELECTRON LTD0 citations51
US9640388B2May 2, 2017

Method for forming insulating film and method for manufacturing semiconductor device

TOKYO ELECTRON LTD0 citations46
US7307019B2Dec 11, 2007

Method for supercritical carbon dioxide processing of fluoro-carbon films

TOKYO ELECTRON LTD1 citations46
US8017197B2Sep 13, 2011

Plasma processing method and plasma processing apparatus

TOKYO ELECTRON LTD0 citations42

HITACHI HIGH TECH CORP

6 patents

KANEKA CORP

4 patents

KAWAMURA KOHEI

3 patents

MATSUOKA TAKAAKI

2 patents

TEL YAMANISHI KK

1 patent

RIKAGAKU KENKYUSHO

1 patent

TAKUMA KK

1 patent

CANON KK

1 patent

TAKATSUKI KOICHI

1 patent

HOKUYO CO LTD

1 patent

UNIV TOHOKU NAT UNIV CORP

1 patent

TOKYO EECTRON LTD

1 patent