Inventor
AOI NOBUO
JP48 patents
⚠️ This page may combine multiple inventors who share the name “AOI NOBUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD
32 patentsUS5989998ANov 23, 1999
Method of forming interlayer insulating film
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD254 citations99
US6387824B1May 14, 2002
Method for forming porous forming film wiring structure
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD80 citations98
US7060323B2Jun 13, 2006
Method of forming interlayer insulating film
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD38 citations96
US6558756B2May 6, 2003
Method of forming interlayer insulating film
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD42 citations96
US6242339B1Jun 5, 2001
Interconnect structure and method for forming the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD76 citations96
US5084125AJan 28, 1992
Apparatus and method for producing semiconductor substrate
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD57 citations96
US6873052B2Mar 29, 2005
Porous, film, wiring structure, and method of forming the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD15 citations92
US6602802B2Aug 5, 2003
Method of forming a porous film on a substrate
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD20 citations92
US6545361B2Apr 8, 2003
Semiconductor device having multilevel interconnection structure and method for fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD23 citations92
US6458720B1Oct 1, 2002
Method for forming interlayer dielectric film
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD21 citations92
US6455436B1Sep 24, 2002
Method of fabricating semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD31 citations92
US6319854B1Nov 20, 2001
Method of forming porous film and material for porous film
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD26 citations92
US6232237B1May 15, 2001
Method for fabricating semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD31 citations92
US6197696B1Mar 6, 2001
Method for forming interconnection structure
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD28 citations92
US5877080AMar 2, 1999
Method of manufacturing semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD24 citations92
US5863834AJan 26, 1999
Semiconductor device and method of manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD18 citations83
US5942802AAug 24, 1999
Semiconductor device and method of producing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD16 citations82
US6333257B1Dec 25, 2001
Interconnection structure and method for forming the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD11 citations74
US6287973B2Sep 11, 2001
Method for forming interconnection structure
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD11 citations74
US6200912B1Mar 13, 2001
Semiconductor device and method of producing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD12 citations74
US6194029B1Feb 27, 2001
Method of forming porous film and material for porous film
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD8 citations74
US6171979B1Jan 9, 2001
Semiconductor device and method of producing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD11 citations74
US5820746AOct 13, 1998
Metal surface state evaluation method and semiconductor device production method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD8 citations73
US7291919B2Nov 6, 2007
Interlayer dielectric film, and method for forming the same and interconnection
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations63
US7232874B2Jun 19, 2007
Interlayer insulating film, method for forming the same and polymer composition
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations63
US6903006B2Jun 7, 2005
Interlayer dielectric film, and method for forming the same and interconnection
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD3 citations63
US7396778B2Jul 8, 2008
Method for synthesizing polymeric material, method for forming polymer thin film and method for forming interlayer insulating film
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD0 citations52
US6936552B2Aug 30, 2005
Method for synthesizing polymeric material, method for forming polymer thin film and method for forming interlayer insulating film
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD0 citations52
USRE38753EJul 5, 2005
Interconnect structure and method for forming the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD0 citations52
US6828257B2Dec 7, 2004
Method for forming interlayer dielectric film
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD0 citations52
US6780779B2Aug 24, 2004
Method of fabricating semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD0 citations52
US6710451B2Mar 23, 2004
Interconnect structure and method for forming the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD0 citations52
PANASONIC CORP
13 patentsUS8941238B2Jan 27, 2015
Semiconductor device
PANASONIC CORP7 citations84
US7663239B2Feb 16, 2010
Semiconductor device and method for fabricating the same
PANASONIC CORP12 citations84
US8937368B2Jan 20, 2015
Semiconductor device
PANASONIC CORP6 citations73
US7659626B2Feb 9, 2010
Semiconductor device including a barrier metal film
PANASONIC CORP2 citations63
US7648908B2Jan 19, 2010
Method for forming inlaid interconnect
PANASONIC CORP4 citations63
US9917066B2Mar 13, 2018
Semiconductor device having stacked chips, a re-distribution layer, and penetration electrodes
PANASONIC CORP1 citations52
US7960489B2Jun 14, 2011
Interlayer insulating film, method for forming the same and polymer compositon
PANASONIC CORP0 citations52
US7947338B2May 24, 2011
Method of forming an interlayer insulating film having a siloxane skeleton
PANASONIC CORP0 citations52
US7893535B2Feb 22, 2011
Semiconductor device and method for fabricating the same
PANASONIC CORP1 citations52
US7816267B2Oct 19, 2010
Method for forming inlaid interconnect
PANASONIC CORP1 citations52
US7696627B2Apr 13, 2010
Multilayered interconnect structure and method for fabricating the same
PANASONIC CORP0 citations52
US7691453B2Apr 6, 2010
Method for forming organic/inorganic hybrid insulation film
PANASONIC CORP1 citations52
US7947375B2May 24, 2011
Interlayer dielectric film
PANASONIC CORP0 citations42