Inventor
JANG WON-JUN
KR17 patents
⚠️ This page may combine multiple inventors who share the name “JANG WON-JUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
9 patentsUS7741222B2Jun 22, 2010
Etch stop structure and method of manufacture, and semiconductor device and method of manufacture
SAMSUNG ELECTRONICS CO LTD17 citations81
US7410869B2Aug 12, 2008
Method of manufacturing a semiconductor device
SAMSUNG ELECTRONICS CO LTD7 citations73
US10455998B2Oct 29, 2019
Vacuum cleaner
SAMSUNG ELECTRONICS CO LTD4 citations70
US9168510B2Oct 27, 2015
Nickel catalysts for reforming hydrocarbons
SAMSUNG ELECTRONICS CO LTD2 citations62
US7972923B2Jul 5, 2011
Non-volatile memory device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD3 citations62
US7723182B2May 25, 2010
Storage electrode of a capacitor and a method of forming the same
SAMSUNG ELECTRONICS CO LTD3 citations62
US7223657B2May 29, 2007
Methods of fabricating flash memory devices with floating gates that have reduced seams
SAMSUNG ELECTRONICS CO LTD3 citations62
US7855117B2Dec 21, 2010
Method of forming a thin layer and method of manufacturing a semiconductor device
SAMSUNG ELECTRONICS CO LTD2 citations61
US7459364B2Dec 2, 2008
Methods of forming self-aligned floating gates using multi-etching
SAMSUNG ELECTRONICS CO LTD4 citations61
WONIK IPS CO LTD
5 patentsUS12563801B2Feb 24, 2026
Processing method for substrate
WONIK IPS CO LTD0 citations62
US12563802B2Feb 24, 2026
Processing method for substrate
WONIK IPS CO LTD0 citations62
US11823907B2Nov 21, 2023
Processing method for substrate
WONIK IPS CO LTD0 citations62
US12371783B2Jul 29, 2025
Internal chamber processing method and substrate processing method
WONIK IPS CO LTD0 citations44
US12027371B2Jul 2, 2024
Substrate processing method
WONIK IPS CO LTD0 citations42