Inventor · disambiguated record
Eric Henri Jan Hendrickx
Also filed as: HENDRICKX ERIC · HENDRICKX ERIC HENRI JAN
6 granted patents·3 pending applications·126 citations·filing 1998–2024
80Inventor score
Files withASML NETHERLANDS BV3CALIFORNIA INST OF TECHN2HENDRICKX ERIC HENRI JAN2IMEC1LAIR LIQUIDE SA POUR LETUDE ET L’EXPLOITATION DES PROCEDES GEORGES CLAUDE1
Top patents by PatentIndex Score
9 records- 0195US6090332AProcess of changing the refractive index of a composite containing a polymer and a compound having large dipole moment and polarizability and applications thereofCALIFORNIA INST OF TECHN·Filed 1998·Granted Jul 18, 2000·108 cites·5 claims
- 0271US7466413B2Marker structure, mask pattern, alignment method and lithographic method and apparatusASML NETHERLANDS BV·Filed 2004·Granted Dec 16, 2008·11 cites·3 claims
- 0360US2025172345A1Heat exchanger with leak detection systemLAIR LIQUIDE SA POUR LETUDE ET L’EXPLOITATION DES PROCEDES GEORGES CLAUDE·Filed 2024·Application pending·0 cites
- 0459US8510686B2Inverse lithography for high transmission attenuated phase shift mask design and creationHENDRICKX ERIC HENRI JAN·Filed 2011·Granted Aug 13, 2013·1 cites·21 claims
- 0554US12117730B2Method and apparatus for photolithographic imagingASML NETHERLANDS BV·Filed 2020·Granted Oct 15, 2024·0 cites·20 claims
- 0652US6402994B1Thermally stable molecules with large dipole moments and polarizabilities and applications thereofCALIFORNIA INST OF TECHN·Filed 2000·Granted Jun 11, 2002·6 cites·7 claims
- 0751US2009073406A1Marker structure, mask pattern, alignment method, and lithographic method and apparatusASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
- 0845US2010216061A1Inverse Lithography For High Transmission Attenuated Phase Shift Mask Design And CreationHENDRICKX ERIC HENRI JAN·Filed 2009·Application pending·0 cites
- 0933US7761837B2Method of making alternating phase shift masksIMEC·Filed 2006·Granted Jul 20, 2010·0 cites·9 claims
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