Inventor
HIGASHIKI TATSUHIKO
JP24 patents
⚠️ This page may combine multiple inventors who share the name “HIGASHIKI TATSUHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
18 patentsUS6262792B1Jul 17, 2001
Optical exposure apparatus of scanning exposure system and its exposing method
TOSHIBA KK54 citations96
US6813001B2Nov 2, 2004
Exposure method and apparatus
TOSHIBA KK20 citations92
US6730447B2May 4, 2004
Manufacturing system in electronic devices
TOSHIBA KK20 citations92
US6437858B1Aug 20, 2002
Aberration measuring method, aberration measuring system and aberration measuring mask
TOSHIBA KK33 citations92
US6288556B1Sep 11, 2001
Method of electrical measurement of misregistration of patterns
TOSHIBA KK26 citations92
US7546178B2Jun 9, 2009
Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device
TOSHIBA KK14 citations83
US6842230B2Jan 11, 2005
Exposing method
TOSHIBA KK13 citations82
US6008880ADec 28, 1999
Exposure tool and method capable of correcting high (N-TH) order light exposure errors depending upon an interfield coordinate
TOSHIBA KK18 citations82
US7018932B2Mar 28, 2006
Method for manufacturing a semiconductor device and apparatus for manufacturing a semiconductor device
TOSHIBA KK7 citations74
US6479201B2Nov 12, 2002
Optical exposure apparatus of scanning exposure system and its exposing method
TOSHIBA KK6 citations73
US7139998B2Nov 21, 2006
Photomask designing method, pattern predicting method and computer program product
TOSHIBA KK2 citations63
US7269470B2Sep 11, 2007
Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device
TOSHIBA KK4 citations62
US7100146B2Aug 29, 2006
Design system of alignment marks for semiconductor manufacture
TOSHIBA KK2 citations62
US7046334B2May 16, 2006
Displacement correction apparatus, exposure system, exposure method and a computer program product
TOSHIBA KK4 citations62
US7985958B2Jul 26, 2011
Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program
TOSHIBA KK1 citations51
US7630052B2Dec 8, 2009
Exposure processing system, exposure processing method and method for manufacturing a semiconductor device
TOSHIBA KK1 citations51
US6872508B2Mar 29, 2005
Exposure method and method of manufacturing semiconductor device
TOSHIBA KK0 citations51
US7968272B2Jun 28, 2011
Semiconductor device manufacturing method to form resist pattern
TOSHIBA KK0 citations42