Inventor
XU WENYU
US181 patents
⚠️ This page may combine multiple inventors who share the name “XU WENYU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
48 patentsUS9899515B1Feb 20, 2018
Fabrication of a pair of vertical fin field effect transistors having a merged top source/drain
IBM46 citations98
US9859166B1Jan 2, 2018
Vertical field effect transistor having U-shaped top spacer
IBM52 citations98
US10424639B1Sep 24, 2019
Nanosheet transistor with high-mobility channel
IBM33 citations94
US10229971B1Mar 12, 2019
Integration of thick and thin nanosheet transistors on a single chip
IBM36 citations94
US10141448B1Nov 27, 2018
Vertical FETs with different gate lengths and spacer thicknesses
IBM22 citations94
US9972542B1May 15, 2018
Hybrid-channel nano-sheet FETs
IBM22 citations94
US9859409B2Jan 2, 2018
Single-electron transistor with wrap-around gate
IBM28 citations94
US9853028B1Dec 26, 2017
Vertical FET with reduced parasitic capacitance
IBM33 citations94
US9799655B1Oct 24, 2017
Flipped vertical field-effect-transistor
IBM21 citations94
US9761728B1Sep 12, 2017
Self-aligned source/drain junction for vertical field-effect transistor (FET) and method of forming the same
IBM33 citations94
US9741717B1Aug 22, 2017
FinFETs with controllable and adjustable channel doping
IBM23 citations94
US9721845B1Aug 1, 2017
Vertical field effect transistors with bottom contact metal directly beneath fins
IBM21 citations94
US9607899B1Mar 28, 2017
Integration of vertical transistors with 3D long channel transistors
IBM22 citations94
US10083871B2Sep 25, 2018
Fabrication of a vertical transistor with self-aligned bottom source/drain
IBM16 citations93
US9768085B1Sep 19, 2017
Top contact resistance measurement in vertical FETs
IBM17 citations93
US10566445B2Feb 18, 2020
Gate spacer and inner spacer formation for nanosheet transistors having relatively small space between gates
IBM11 citations86
US10615256B2Apr 7, 2020
Nanosheet transistor gate structure having reduced parasitic capacitance
IBM7 citations84
US10615258B2Apr 7, 2020
Nanosheet semiconductor structure with inner spacer formed by oxidation
IBM5 citations84
US10559502B2Feb 11, 2020
Fabrication of a pair of vertical fin field effect transistors having a merged top source/drain
IBM4 citations84
US10505048B1Dec 10, 2019
Self-aligned source/drain contact for vertical field effect transistor
IBM7 citations84
US10504793B2Dec 10, 2019
Hybrid-channel nano-sheet FETs
IBM3 citations84
US10505019B1Dec 10, 2019
Vertical field effect transistors with self aligned source/drain junctions
IBM6 citations84
US10388577B1Aug 20, 2019
Nanosheet devices with different types of work function metals
IBM6 citations84
US10361200B1Jul 23, 2019
Vertical fin field effect transistor with integral U-shaped electrical gate connection
IBM8 citations84
US10340364B2Jul 2, 2019
H-shaped VFET with increased current drivability
IBM11 citations84
US10312350B1Jun 4, 2019
Nanosheet with changing SiGe percentage for SiGe lateral recess
IBM7 citations84
US10176997B1Jan 8, 2019
Direct gate patterning for vertical transport field effect transistor
IBM12 citations84
US10141234B2Nov 27, 2018
Flipped vertical field-effect-transistor
IBM3 citations84
US10134874B2Nov 20, 2018
Vertical field effect transistors with bottom source/drain epitaxy
IBM4 citations84
US10103246B2Oct 16, 2018
Fabrication of a vertical fin field effect transistor (vertical finFET) with a self-aligned gate and fin edges
IBM8 citations84
US10032676B1Jul 24, 2018
Vertical field effect transistor having U-shaped top spacer
IBM9 citations84
US10002803B2Jun 19, 2018
Flipped vertical field-effect-transistor
IBM4 citations84
US9960164B2May 1, 2018
Flipped vertical field-effect-transistor
IBM5 citations84
US9865705B2Jan 9, 2018
Vertical field effect transistors with bottom source/drain epitaxy
IBM10 citations84
US9722125B1Aug 1, 2017
Radiation sensor, method of forming the sensor and device including the sensor
IBM8 citations84
US9653458B1May 16, 2017
Integrated device with P-I-N diodes and vertical field effect transistors
IBM18 citations84
US9653602B1May 16, 2017
Tensile and compressive fins for vertical field effect transistors
IBM14 citations84
US9595605B1Mar 14, 2017
Vertical single electron transistor formed by condensation
IBM7 citations84
US11621348B2Apr 4, 2023
Vertical transistor devices with composite high-K and low-K spacers with a controlled top junction
IBM2 citations73
US11515401B2Nov 29, 2022
Vertical fin field effect transistor with a reduced gate-to-bottom source/drain parasitic capacitance
IBM1 citations73
US11430864B2Aug 30, 2022
VFET device with controllable top spacer
IBM2 citations73
US11107905B2Aug 31, 2021
Vertical field effect transistors with self aligned source/drain junctions
IBM2 citations73
US11062959B2Jul 13, 2021
Inner spacer and junction formation for integrating extended-gate and standard-gate nanosheet transistors
IBM2 citations73
US10985161B2Apr 20, 2021
Single diffusion break isolation for gate-all-around field-effect transistor devices
IBM5 citations73
US10985073B2Apr 20, 2021
Vertical field effect transistor replacement metal gate fabrication
IBM4 citations73
US10971585B2Apr 6, 2021
Gate spacer and inner spacer formation for nanosheet transistors having relatively small space between adjacent gates
IBM4 citations73
US10964602B2Mar 30, 2021
Fabrication of a pair of vertical fin field effect transistors having a merged top source/drain
IBM1 citations73
US10964601B2Mar 30, 2021
Fabrication of a pair of vertical fin field effect transistors having a merged top source/drain
IBM1 citations73
NEUBORON MEDTECH LTD
1 patentTESSERA LLC
1 patentShowing the top 50 of 181 patents by PatentIndex Score.