P

Inventor

XU WENYU

US181 patents
⚠️ This page may combine multiple inventors who share the name “XU WENYU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

48 patents
US9899515B1Feb 20, 2018

Fabrication of a pair of vertical fin field effect transistors having a merged top source/drain

IBM46 citations98
US9859166B1Jan 2, 2018

Vertical field effect transistor having U-shaped top spacer

IBM52 citations98
US10424639B1Sep 24, 2019

Nanosheet transistor with high-mobility channel

IBM33 citations94
US10229971B1Mar 12, 2019

Integration of thick and thin nanosheet transistors on a single chip

IBM36 citations94
US10141448B1Nov 27, 2018

Vertical FETs with different gate lengths and spacer thicknesses

IBM22 citations94
US9972542B1May 15, 2018

Hybrid-channel nano-sheet FETs

IBM22 citations94
US9859409B2Jan 2, 2018

Single-electron transistor with wrap-around gate

IBM28 citations94
US9853028B1Dec 26, 2017

Vertical FET with reduced parasitic capacitance

IBM33 citations94
US9799655B1Oct 24, 2017

Flipped vertical field-effect-transistor

IBM21 citations94
US9761728B1Sep 12, 2017

Self-aligned source/drain junction for vertical field-effect transistor (FET) and method of forming the same

IBM33 citations94
US9741717B1Aug 22, 2017

FinFETs with controllable and adjustable channel doping

IBM23 citations94
US9721845B1Aug 1, 2017

Vertical field effect transistors with bottom contact metal directly beneath fins

IBM21 citations94
US9607899B1Mar 28, 2017

Integration of vertical transistors with 3D long channel transistors

IBM22 citations94
US10083871B2Sep 25, 2018

Fabrication of a vertical transistor with self-aligned bottom source/drain

IBM16 citations93
US9768085B1Sep 19, 2017

Top contact resistance measurement in vertical FETs

IBM17 citations93
US10566445B2Feb 18, 2020

Gate spacer and inner spacer formation for nanosheet transistors having relatively small space between gates

IBM11 citations86
US10615256B2Apr 7, 2020

Nanosheet transistor gate structure having reduced parasitic capacitance

IBM7 citations84
US10615258B2Apr 7, 2020

Nanosheet semiconductor structure with inner spacer formed by oxidation

IBM5 citations84
US10559502B2Feb 11, 2020

Fabrication of a pair of vertical fin field effect transistors having a merged top source/drain

IBM4 citations84
US10505048B1Dec 10, 2019

Self-aligned source/drain contact for vertical field effect transistor

IBM7 citations84
US10504793B2Dec 10, 2019

Hybrid-channel nano-sheet FETs

IBM3 citations84
US10505019B1Dec 10, 2019

Vertical field effect transistors with self aligned source/drain junctions

IBM6 citations84
US10388577B1Aug 20, 2019

Nanosheet devices with different types of work function metals

IBM6 citations84
US10361200B1Jul 23, 2019

Vertical fin field effect transistor with integral U-shaped electrical gate connection

IBM8 citations84
US10340364B2Jul 2, 2019

H-shaped VFET with increased current drivability

IBM11 citations84
US10312350B1Jun 4, 2019

Nanosheet with changing SiGe percentage for SiGe lateral recess

IBM7 citations84
US10176997B1Jan 8, 2019

Direct gate patterning for vertical transport field effect transistor

IBM12 citations84
US10141234B2Nov 27, 2018

Flipped vertical field-effect-transistor

IBM3 citations84
US10134874B2Nov 20, 2018

Vertical field effect transistors with bottom source/drain epitaxy

IBM4 citations84
US10103246B2Oct 16, 2018

Fabrication of a vertical fin field effect transistor (vertical finFET) with a self-aligned gate and fin edges

IBM8 citations84
US10032676B1Jul 24, 2018

Vertical field effect transistor having U-shaped top spacer

IBM9 citations84
US10002803B2Jun 19, 2018

Flipped vertical field-effect-transistor

IBM4 citations84
US9960164B2May 1, 2018

Flipped vertical field-effect-transistor

IBM5 citations84
US9865705B2Jan 9, 2018

Vertical field effect transistors with bottom source/drain epitaxy

IBM10 citations84
US9722125B1Aug 1, 2017

Radiation sensor, method of forming the sensor and device including the sensor

IBM8 citations84
US9653458B1May 16, 2017

Integrated device with P-I-N diodes and vertical field effect transistors

IBM18 citations84
US9653602B1May 16, 2017

Tensile and compressive fins for vertical field effect transistors

IBM14 citations84
US9595605B1Mar 14, 2017

Vertical single electron transistor formed by condensation

IBM7 citations84
US11621348B2Apr 4, 2023

Vertical transistor devices with composite high-K and low-K spacers with a controlled top junction

IBM2 citations73
US11515401B2Nov 29, 2022

Vertical fin field effect transistor with a reduced gate-to-bottom source/drain parasitic capacitance

IBM1 citations73
US11430864B2Aug 30, 2022

VFET device with controllable top spacer

IBM2 citations73
US11107905B2Aug 31, 2021

Vertical field effect transistors with self aligned source/drain junctions

IBM2 citations73
US11062959B2Jul 13, 2021

Inner spacer and junction formation for integrating extended-gate and standard-gate nanosheet transistors

IBM2 citations73
US10985161B2Apr 20, 2021

Single diffusion break isolation for gate-all-around field-effect transistor devices

IBM5 citations73
US10985073B2Apr 20, 2021

Vertical field effect transistor replacement metal gate fabrication

IBM4 citations73
US10971585B2Apr 6, 2021

Gate spacer and inner spacer formation for nanosheet transistors having relatively small space between adjacent gates

IBM4 citations73
US10964602B2Mar 30, 2021

Fabrication of a pair of vertical fin field effect transistors having a merged top source/drain

IBM1 citations73
US10964601B2Mar 30, 2021

Fabrication of a pair of vertical fin field effect transistors having a merged top source/drain

IBM1 citations73

NEUBORON MEDTECH LTD

1 patent

TESSERA LLC

1 patent

Showing the top 50 of 181 patents by PatentIndex Score.