Inventor

FUJIMURA AKIRA

US171 patents

⚠️ This page may combine multiple inventors who share the name “FUJIMURA AKIRA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUJIMURA AKIRA

D2S INC

Method and system for design of a reticle to be manufactured using variable shaped beam lithography

Method for manufacturing a surface and integrated circuit using variable shaped beam lithography

Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography

Method and system for design of a reticle to be manufactured using character projection lithography

Method for forming circular patterns on a surface

Method and system for design of a reticle to be manufactured using variable shaped beam lithography

Method, device, and system for forming circular patterns on a surface

Method for design and manufacture of a reticle using variable shaped beam lithography

Method and system for forming high accuracy patterns using charged particle beam lithography

Method for manufacturing a surface and integrated circuit using variable shaped beam lithography

Method and system for manufacturing a reticle using character projection particle beam lithography

Method and system for manufacturing a reticle using character projection lithography

Method and system for logic design for cell projection particle beam lithography

Method and system for forming patterns using charged particle beam lithography

Method and system for forming a pattern on a reticle using charged particle beam lithography

Method and system for forming patterns using charged particle beam lithography with variable pattern dosage

Method and system for forming patterns using charged particle beam lithography with variable pattern dosage

Method and system for forming a pattern on a reticle using charged particle beam lithography

Method and system for dimensional uniformity using charged particle beam lithography

Method and system for forming a pattern on a reticle using charged particle beam lithography

Method and system for design of a reticle to be manufactured using variable shaped beam lithography

Method for fracturing and forming a pattern using shaped beam charged particle beam lithography

Method for fracturing circular patterns and for manufacturing a semiconductor device

Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography

Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shots

CADENCE DESIGN SYSTEMS INC

Method and system for distributing clock signals on non Manhattan semiconductor integrated circuits

Manufacturing aware design of integrated circuit layouts

Method and apparatus for creating efficient vias between metal layers in semiconductor designs and layouts

Methods and apparatus for defining power grid structures having diagonal stripes

Integrated circuit wiring architectures to support independent designs

Simulating euclidean wiring directions using manhattan and diagonal directional wires

Multi-directional wiring on a single metal layer

Method and system for improvement of dose correction for particle beam writers

Local preferred direction architecture, tools, and apparatus

Manufacturing aware design and design aware manufacturing of an integrated circuit

FUJIMURA AKIRA

Method and system for forming high accuracy patterns using charged particle beam lithography

Method for fracturing and forming a pattern using shaped beam charged particle beam lithography

Method and system for forming circular patterns on a surface

Method and system for design of a reticle to be manufactured using variable shaped beam lithography

Method and system for design of a reticle to be manufactured using variable shaped beam lithography

Method for manufacturing a surface and integrated circuit using variable shaped beam lithography

Method for design and manufacture of diagonal patterns with variable shaped beam lithography

HONDA MOTOR CO LTD

Control system for internal combustion engines

Battery control apparatus for battery carried by hybrid vehicle

Battery control apparatus for hybrid vehicle

ZABLE HAROLD ROBERT

Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages

Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area

Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography

NIPPON ELECTRIC CO

Flat-article sorting apparatus

DS2 INC

Method for optical proximity correction of a reticle to be manufactured using variable shaped beam lithography