Inventor
SASAJIMA RYOTA
JP36 patents
⚠️ This page may combine multiple inventors who share the name “SASAJIMA RYOTA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI INT ELECTRIC INC
26 patentsUSD783351SApr 11, 2017
Gas nozzle substrate processing apparatus
HITACHI INT ELECTRIC INC473 citations99
US7625205B2Dec 1, 2009
Heat treatment apparatus and method of manufacturing substrates
HITACHI INT ELECTRIC INC21 citations92
US9263253B2Feb 16, 2016
Method of manufacturing a SiOCN film, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC9 citations84
US9218955B2Dec 22, 2015
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC7 citations84
US8951919B2Feb 10, 2015
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC6 citations84
US8728954B2May 20, 2014
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC6 citations84
US9620357B2Apr 11, 2017
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC8 citations83
US7891975B2Feb 22, 2011
Heat treatment apparatus and method of manufacturing substrate
HITACHI INT ELECTRIC INC9 citations83
US7820118B2Oct 26, 2010
Substrate processing apparatus having covered thermocouple for enhanced temperature control
HITACHI INT ELECTRIC INC8 citations83
US9837262B2Dec 5, 2017
Method of manufacturing a SiOCN film, substrate processing apparatus and recording medium
HITACHI INT ELECTRIC INC2 citations73
US9455137B2Sep 27, 2016
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC3 citations73
US9390911B2Jul 12, 2016
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC5 citations73
US10081868B2Sep 25, 2018
Gas supply nozzle, substrate processing apparatus, and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC6 citations72
US10036092B2Jul 31, 2018
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC3 citations72
US9966252B2May 8, 2018
Method of manufacturing semiconductor device and substrate processing apparatus
HITACHI INT ELECTRIC INC2 citations72
US9966251B2May 8, 2018
Method of manufacturing semiconductor device and substrate processing apparatus
HITACHI INT ELECTRIC INC2 citations72
US9340872B2May 17, 2016
Cleaning method, manufacturing method of semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC3 citations72
US9394607B2Jul 19, 2016
Substrate processing apparatus
HITACHI INT ELECTRIC INC3 citations70
US9431236B2Aug 30, 2016
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC1 citations63
US9412585B2Aug 9, 2016
Method of manufacturing a SiOCN film, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC1 citations63
US8946092B2Feb 3, 2015
Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus
HITACHI INT ELECTRIC INC2 citations63
US9691606B2Jun 27, 2017
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC0 citations52
US10287680B2May 14, 2019
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC0 citations51
US10066294B2Sep 4, 2018
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC0 citations51
US9881789B2Jan 30, 2018
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC1 citations51
US7901206B2Mar 8, 2011
Heat-treating apparatus and method of producing substrates
HITACHI INT ELECTRIC INC0 citations40
SASAJIMA RYOTA
4 patentsUS8252701B2Aug 28, 2012
Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus
SASAJIMA RYOTA16 citations90
US9039838B2May 26, 2015
Method of manufacturing semiconductor device and substrate processing apparatus
SASAJIMA RYOTA2 citations60
US9136114B2Sep 15, 2015
Method of manufacturing semiconductor device, substrate processing method, computer-readable medium with program for executing a substrate processing method, and substrate processing apparatus
SASAJIMA RYOTA1 citations51
US9096928B2Aug 4, 2015
Method of manufacturing semiconductor device and substrate processing apparatus
SASAJIMA RYOTA0 citations40
AKAE NAONORI
2 patentsUS8415258B2Apr 9, 2013
Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus
AKAE NAONORI480 citations98
US8076251B2Dec 13, 2011
Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus
AKAE NAONORI489 citations98
HIROSE YOSHIRO
2 patentsUS8546272B2Oct 1, 2013
Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus
HIROSE YOSHIRO6 citations83
US9378943B2Jun 28, 2016
Method of manufacturing semiconductor device, method of processing substrate substrate processing apparatus and non-transitory computer-readable recording medium
HIROSE YOSHIRO1 citations51