Inventor
KODERA MASAKO
JP37 patents
⚠️ This page may combine multiple inventors who share the name “KODERA MASAKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
22 patentsUS5948205ASep 7, 1999
Polishing apparatus and method for planarizing layer on a semiconductor wafer
TOSHIBA KK41 citations96
US5914275AJun 22, 1999
Polishing apparatus and method for planarizing layer on a semiconductor wafer
TOSHIBA KK43 citations96
US5695601ADec 9, 1997
Method for planarizing a semiconductor body by CMP method and an apparatus for manufacturing a semiconductor device using the method
TOSHIBA KK60 citations96
US5597341AJan 28, 1997
Semiconductor planarizing apparatus
TOSHIBA KK60 citations96
US5445996AAug 29, 1995
Method for planarizing a semiconductor device having a amorphous layer
TOSHIBA KK87 citations96
US5398459AMar 21, 1995
Method and apparatus for polishing a workpiece
TOSHIBA KK74 citations96
US6224464B1May 1, 2001
Polishing method and polisher used in the method
TOSHIBA KK39 citations92
US6419557B2Jul 16, 2002
Polishing method and polisher used in the method
TOSHIBA KK14 citations84
US5578531ANov 26, 1996
Method for manufacturing semiconductor device
TOSHIBA KK18 citations74
US5278104AJan 11, 1994
Semiconductor wafer carrier having a dust cover
TOSHIBA KK10 citations74
US5131546AJul 21, 1992
Semiconductor wafer support carrier
TOSHIBA KK13 citations74
US6992009B2Jan 31, 2006
Method of manufacturing a semiconductor device
TOSHIBA KK9 citations73
US6903015B2Jun 7, 2005
Method of manufacturing a semiconductor device using a wet process
TOSHIBA KK10 citations73
US5395645AMar 7, 1995
Method for forming a silicon oxide film on a silicon waffer
TOSHIBA KK9 citations73
US7101259B2Sep 5, 2006
Polishing method and apparatus
TOSHIBA KK7 citations72
US10256314B2Apr 9, 2019
Semiconductor device
TOSHIBA KK1 citations63
US7727891B2Jun 1, 2010
Method of manufacturing a semiconductor device using a wet process
TOSHIBA KK2 citations62
US5489336AFeb 6, 1996
Apparatus for forming a silicon oxide film on a silicon wafer
TOSHIBA KK3 citations62
US6783658B2Aug 31, 2004
Electropolishing method
TOSHIBA KK2 citations58
US10692206B2Jun 23, 2020
Crystal analysis apparatus and crystal analysis method
TOSHIBA KK0 citations52
US8754433B2Jun 17, 2014
Semiconductor device and method of manufacturing the same
TOSHIBA KK0 citations52
US6410439B1Jun 25, 2002
Semiconductor polishing apparatus and method for chemical/mechanical polishing of films
TOSHIBA KK1 citations52
EBARA CORP
8 patentsUS5860847AJan 19, 1999
Polishing apparatus
EBARA CORP63 citations96
US5860181AJan 19, 1999
Method of and apparatus for cleaning workpiece
EBARA CORP64 citations95
US5653623AAug 5, 1997
Polishing apparatus with improved exhaust
EBARA CORP38 citations93
US5830041ANov 3, 1998
Method and apparatus for determining endpoint during a polishing process
EBARA CORP49 citations92
US6667238B1Dec 23, 2003
Polishing method and apparatus
EBARA CORP15 citations91
US5846335ADec 8, 1998
Method for cleaning workpiece
EBARA CORP40 citations91
US10328465B2Jun 25, 2019
Substrate processing apparatus and substrate processing method
EBARA CORP6 citations84
US10799917B2Oct 13, 2020
Substrate processing apparatus and substrate processing method
EBARA CORP0 citations52