Inventor
YANG SHENG-HSING
TW48 patents
⚠️ This page may combine multiple inventors who share the name “YANG SHENG-HSING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNITED MICROELECTRONICS CORP
45 patentsUS5442214AAug 15, 1995
VDMOS transistor and manufacturing method therefor
UNITED MICROELECTRONICS CORP174 citations99
US5424231AJun 13, 1995
Method for manufacturing a VDMOS transistor
UNITED MICROELECTRONICS CORP171 citations99
US5501996AMar 26, 1996
Method of manufacture of high coupling ratio single polysilicon floating gate EPROM or EEPROM cell
UNITED MICROELECTRONICS CORP54 citations95
US6153913ANov 28, 2000
Electrostatic discharge protection circuit
UNITED MICROELECTRONICS CORP36 citations93
US5614421AMar 25, 1997
Method of fabricating junction termination extension structure for high-voltage diode devices
UNITED MICROELECTRONICS CORP54 citations93
US5466616ANov 14, 1995
Method of producing an LDMOS transistor having reduced dimensions, reduced leakage, and a reduced propensity to latch-up
UNITED MICROELECTRONICS CORP43 citations93
US5376572ADec 27, 1994
Method of making an electrically erasable programmable memory device with improved erase and write operation
UNITED MICROELECTRONICS CORP33 citations92
US5382820AJan 17, 1995
High voltage CMOS device to integrate low voltage controlling device
UNITED MICROELECTRONICS CORP26 citations90
US6306711B1Oct 23, 2001
Method of fabricating a high-voltage lateral double diffused metal oxide semiconductor
UNITED MICROELECTRONICS CORP20 citations84
US5482873AJan 9, 1996
Method for fabricating a bipolar power transistor
UNITED MICROELECTRONICS CORP19 citations84
US5574306ANov 12, 1996
Lateral bipolar transistor and FET
UNITED MICROELECTRONICS CORP16 citations81
US6063674AMay 16, 2000
Method for forming high voltage device
UNITED MICROELECTRONICS CORP15 citations74
US5686347ANov 11, 1997
Self isolation manufacturing method
UNITED MICROELECTRONICS CORP7 citations74
US5569613AOct 29, 1996
Method of making bipolar junction transistor
UNITED MICROELECTRONICS CORP11 citations74
US5550064AAug 27, 1996
Method for fabricating high-voltage complementary metal-oxide-semiconductor transistors
UNITED MICROELECTRONICS CORP7 citations74
US5547895AAug 20, 1996
Method of fabricating a metal gate MOS transistor with self-aligned first conductivity type source and drain regions and second conductivity type contact regions
UNITED MICROELECTRONICS CORP8 citations74
US5523246AJun 4, 1996
Method of fabricating a high-voltage metal-gate CMOS device
UNITED MICROELECTRONICS CORP8 citations74
US5518938AMay 21, 1996
Process for fabricating a CMOS transistor having high-voltage metal-gate
UNITED MICROELECTRONICS CORP15 citations74
US5508547AApr 16, 1996
LDMOS transistor with reduced projective area of source region
UNITED MICROELECTRONICS CORP9 citations74
US5486482AJan 23, 1996
Process for fabricating metal-gate CMOS transistor
UNITED MICROELECTRONICS CORP9 citations74
US5478760ADec 26, 1995
Process for fabricating a vertical bipolar junction transistor
UNITED MICROELECTRONICS CORP10 citations74
US5455188AOct 3, 1995
Process for fabricating a lateral bipolar junction transistor
UNITED MICROELECTRONICS CORP18 citations74
US5451805ASep 19, 1995
VDMOS transistor with reduced projective area of source region
UNITED MICROELECTRONICS CORP7 citations74
US5444002AAug 22, 1995
Method of fabricating a short-channel DMOS transistor with removable sidewall spacers
UNITED MICROELECTRONICS CORP12 citations74
US5422286AJun 6, 1995
Process for fabricating high-voltage semiconductor power device
UNITED MICROELECTRONICS CORP16 citations74
US5401682AMar 28, 1995
Method of fabricating high voltage junction termination extension structure for a semiconductor integrated circuit device
UNITED MICROELECTRONICS CORP8 citations74
US5395777AMar 7, 1995
Method of producing VDMOS transistors
UNITED MICROELECTRONICS CORP14 citations74
US5393679AFeb 28, 1995
Use of double charge implant to improve retrograde process PMOS punch through voltage
UNITED MICROELECTRONICS CORP11 citations74
US5376568ADec 27, 1994
Method of fabricating high voltage complementary metal oxide semiconductor transistors
UNITED MICROELECTRONICS CORP12 citations74
US5489541AFeb 6, 1996
Process of fabricating a bipolar junction transistor
UNITED MICROELECTRONICS CORP7 citations72
US5576569ANov 19, 1996
Electrically programmable and erasable memory device with depression in lightly-doped source
UNITED MICROELECTRONICS CORP11 citations67
US5514890AMay 7, 1996
Electrically erasable programmable memory device with improved erase and write operation
UNITED MICROELECTRONICS CORP7 citations66
US6040601AMar 21, 2000
High voltage device
UNITED MICROELECTRONICS CORP3 citations63
US5966608AOct 12, 1999
Method of forming high voltage device
UNITED MICROELECTRONICS CORP3 citations63
US5624857AApr 29, 1997
Process for fabricating double well regions in semiconductor devices
UNITED MICROELECTRONICS CORP4 citations63
US5589411ADec 31, 1996
Process for fabricating a high-voltage MOSFET
UNITED MICROELECTRONICS CORP3 citations63
US5554543ASep 10, 1996
Process for fabricating bipolar junction transistor having reduced parasitic capacitance
UNITED MICROELECTRONICS CORP6 citations63
US5498553AMar 12, 1996
Method of making a metal gate high voltage integrated circuit
UNITED MICROELECTRONICS CORP5 citations63
US5360750ANov 1, 1994
Method of fabricating lateral bipolar transistors
UNITED MICROELECTRONICS CORP5 citations63
US6174760B1Jan 16, 2001
Method of improving vertical BJT gain
UNITED MICROELECTRONICS CORP4 citations61
US5449627ASep 12, 1995
Lateral bipolar transistor and FET compatible process for making it
UNITED MICROELECTRONICS CORP2 citations61
US6269315B1Jul 31, 2001
Reliability testing method of dielectric thin film
UNITED MICROELECTRONICS CORP5 citations60
US6165852ADec 26, 2000
Method of fabricating integration of high-voltage devices and low-voltage devices
UNITED MICROELECTRONICS CORP3 citations60
US6255809B1Jul 3, 2001
Method for measuring capacitance of passive device region
UNITED MICROELECTRONICS CORP1 citations52
US5894155AApr 13, 1999
Metal gate high voltage integrated circuit/process
UNITED MICROELECTRONICS CORP0 citations52