Inventor

THACKERAY JAMES W

US93 patents

⚠️ This page may combine multiple inventors who share the name “THACKERAY JAMES W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

THACKERAY JAMES W

SHIPLEY CO LLC

Substrates coated with an antihalation layer that contains a resin binder comprising anthracene units

Antihalation compositions

Antihalation compositions

Photoresist compositions comprising blends of photoacid generators

Antihalation compositions

Photoresist compositions and methods and articles of manufacture comprising same

Radiation sensitive compositions and methods

Method comprising substrates coated with an antihalation layer that contains a resin binder comprising anthracene units

Copolymers and photoresist compositions comprising copolymer resin binder component

Photoresist compositions

Chemically amplified positive photoresists

Antihalation compositions

Thick film photoresists and methods for use thereof

Antihalation compositions

Radiation sensitive compositions comprising complexing polar compound and methods of use thereof

Antihalation compositions

Chemically amplified positive photoresists

Photoresist comprising blends of photoacid generators

Polymer for positive acid catalyzed resists

Photoresist compositions

Radiation sensitive compositions and methods

Radiation sensitive compositions and methods

Photoresist compositions

Photoresist compositions comprising blends of photoacid generators

Positive acid catalyzed resists

ROHM & HAAS ELECT MAT

Coating compositions for use with an overcoated photoresist

Dyed photoresists and methods and articles of manufacture comprising same

Iodine-containing polymers for chemically amplified resist compositions

Acid generators and photoresists comprising same

Polymers and photoresist compositions

Iodine-containing polymers for chemically amplified resist compositions

Iodine-containing photoacid generators and compositions comprising the same

Acid generators and photoresists comprising same

Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device

Methods of forming electronic devices including filling porous features with a polymer

Photoresist composition and associated method of forming an electronic device

SHIPLEY CO

Photoresist pattern fabrication employing chemically amplified metalized material

Photoresist pattern fabrication employing chemically amplified metalized material

Radiation sensitive compositions comprising polymer having acid labile groups

Radiation sensitive compositions comprising polymer having acid labile groups

Method of forming positive images through organometallic treatment of negative acid hardening cross-linked photoresist formulations

THACKERAY JAMES W

Photosensitive compositions

Photoacid generators

GEN ELECTRIC

Interfacial polycondensation polycarbonate process with quaternary phosphonium amino halide catalyst

Interfacial polycondensation polycarbonate process with quaternary phosphonium amino halide catalyst

MASSACHUSETTS INST TECHNOLOGY

Microelectrochemical devices

IBM

Copolymers and photoresist compositions comprising copolymer resin binder component

ROHM & HAAS

Purification process

ROHM AND HAAS ELECTRONICS MATERIALS LLC

Coating compositions for use with an overcoated photoresist

CHO SANGHO

Self-assembled structures, method of manufacture thereof and articles comprising the same