Inventor
WALLRAFF GREGORY M
US24 patents
⚠️ This page may combine multiple inventors who share the name “WALLRAFF GREGORY M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
22 patentsUS5580694ADec 3, 1996
Photoresist composition with androstane and process for its use
IBM68 citations96
US6806026B2Oct 19, 2004
Photoresist composition
IBM62 citations95
US5272042ADec 21, 1993
Positive photoresist system for near-UV to visible imaging
IBM68 citations94
US5250395AOct 5, 1993
Process for imaging of photoresist including treatment of the photoresist with an organometallic compound
IBM34 citations92
US5071730ADec 10, 1991
Liquid apply, aqueous processable photoresist compositions
IBM50 citations92
US5055439AOct 8, 1991
Photoacid generating composition and sensitizer therefor
IBM34 citations92
US5045431ASep 3, 1991
Dry film, aqueous processable photoresist compositions
IBM29 citations92
US5264325ANov 23, 1993
Composition for photo imaging
IBM36 citations91
US7090963B2Aug 15, 2006
Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging
IBM16 citations80
US7135595B2Nov 14, 2006
Photoresist composition
IBM4 citations73
US7014980B2Mar 21, 2006
Photoresist composition
IBM10 citations73
US9772558B2Sep 26, 2017
Sulfonic acid ester containing polymers for organic solvent based dual-tone photoresists
IBM5 citations72
US9057960B2Jun 16, 2015
Resist performance for the negative tone develop organic development process
IBM4 citations72
US9666918B2May 30, 2017
Lithium oxygen battery and electrolyte composition
IBM2 citations71
US7767385B2Aug 3, 2010
Method for lithography for optimizing process conditions
IBM7 citations71
US9450278B2Sep 20, 2016
Cathode material for lithium—oxygen battery
IBM5 citations70
US5204226AApr 20, 1993
Photosensitizers for polysilanes
IBM17 citations69
US8900802B2Dec 2, 2014
Positive tone organic solvent developed chemically amplified resist
IBM3 citations62
US6482566B1Nov 19, 2002
Hydroxycarborane photoresists and process for using same in bilayer thin film imaging lithography
IBM3 citations62
US10957953B2Mar 23, 2021
Lithium oxygen battery and electrolyte composition
IBM0 citations60
US7875408B2Jan 25, 2011
Bleachable materials for lithography
IBM3 citations59
US7951524B2May 31, 2011
Self-topcoating photoresist for photolithography
IBM3 citations57