Photoacid generating composition and sensitizer therefor

Abstract

A composition including an initiator which generates acid upon exposure to radiation in the presence of a sensitizer. The composition may be mixed with an acid sensitive polymer or prepolymer to make a visible light or laser imageable photoresist. The sensitizer has phenylethynyl and methoxy substituents which, when properly positioned, allow it to utilize all of the visible argon ion laser lines.

We claim: 
     
       1. A photoacid generating composition for use in laser direct photoimaging applications, the photoacid generating composition being combinable with a suitable acid sensitive polymer to provide a photoresist composition sensitive to visible wavelength radiation, the photoacid generating composition comprising: (a) a sensitizer having the formula; ##STR6## wherein R 1  and R 2  are non-basic substituents independently selected from the group consisting of alkyl, trialkylsilyl, phenyl and compounds of the formula: ##STR7## where R 3  is alkoxy and alkyl; where x and y are non-basic substituents independently selected from the group consisting of alkyl and alkoxy; and   (b) an initiator which generates an acid upon exposure to radiation in the presence of the above sensitizer.   
     
     
       2. A photoacid generating composition for use in laser direct photoimaging applications, the photoacid generating composition being combinable with a suitable acid sensitive polymer to provide a photoresist composition sensitive to visible wavelength radiation, the photoacid generating composition comprising: (a) a sensitizer having the formula; ##STR8## wherein R 1  and R 2  are non-basic substituents independently selected from the group consisting of trimethylsilyl, phenyl and compounds of the formula: ##STR9## where R 3  is OMe and CH 3  ; where x and y are non-basic substituents independently selected from the group consisting of:   O--4.sub.4     where R 4  is alkyl having about 1 to 20 carbon atoms; and     (b) an initiator which generates an acid upon exposure to radiation in the presence of the above sensitizer.   
     
     
       3. A photoacid generating composition for use in laser direct photoimaging applications comprising a sensitizer and an initiator which generates an acid upon exposures to radiation in the presence of the sensitizer, the photoacid generating composition being combinable with a suitable acid sensitive substance to provide a photoresist composition sensitive to visible wavelength radiation, and wherein the sensitizer is 1,8-dimethoxy-9,10-bis(phenylethynyl)anthracene. 
     
     
       4. The photoacid generating composition of claim 3, wherein the initiator is a diaryliodonium salt. 
     
     
       5. The photoacid generating composition of claim 3, wherein the initiator is diphenyliodonium hexafluoroantimonate. 
     
     
       6. The photoacid generating composition of claim 3, wherein the initiator is di(t-butylphenyl)iodonium trifluoromethane sulfonate.