Inventor
SIMPSON LOGAN L
US17 patents
⚠️ This page may combine multiple inventors who share the name “SIMPSON LOGAN L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
10 patentsUS5374500ADec 20, 1994
Positive photoresist composition containing photoacid generator and use thereof
IBM80 citations94
US5272042ADec 21, 1993
Positive photoresist system for near-UV to visible imaging
IBM68 citations94
US5439766AAug 8, 1995
Composition for photo imaging
IBM96 citations93
US5071730ADec 10, 1991
Liquid apply, aqueous processable photoresist compositions
IBM50 citations92
US5055439AOct 8, 1991
Photoacid generating composition and sensitizer therefor
IBM34 citations92
US5045431ASep 3, 1991
Dry film, aqueous processable photoresist compositions
IBM29 citations92
US5102772AApr 7, 1992
Photocurable epoxy composition with sulfonium salt photoinitiator
IBM26 citations91
US5047568ASep 10, 1991
Sulfonium salts and use and preparation thereof
IBM30 citations91
US5498765AMar 12, 1996
Positive photoresist composition containing photoacid generator and use thereof
IBM18 citations80
US5266444ANov 30, 1993
Method and composition for obtaining image reversal in epoxy formulations based upon photoinhibition
IBM7 citations71
CANON KK
7 patentsUS11215921B2Jan 4, 2022
Residual layer thickness compensation in nano-fabrication by modified drop pattern
CANON KK2 citations71
US11209730B2Dec 28, 2021
Methods of generating drop patterns, systems for shaping films with the drop pattern, and methods of manufacturing an article with the drop pattern
CANON KK2 citations69
US11614693B2Mar 28, 2023
Method of determining the initial contact point for partial fields and method of shaping a surface
CANON KK1 citations62
US12235587B2Feb 25, 2025
Method and system for determining initial contact control values for shaping partial fields and method and system for shaping partial fields
CANON KK0 citations56
US11040366B2Jun 22, 2021
Dispenser shield with adjustable aperture to improve drop placement and residual layer thickness
CANON KK0 citations51
US11762295B2Sep 19, 2023
Fluid droplet methodology and apparatus for imprint lithography
CANON KK0 citations50
US11927883B2Mar 12, 2024
Method and apparatus to reduce variation of physical attribute of droplets using performance characteristic of dispensers
CANON KK0 citations45