Inventor
WILLSON CARLTON G
US28 patents
⚠️ This page may combine multiple inventors who share the name “WILLSON CARLTON G”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
23 patentsUS4491628AJan 1, 1985
Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
IBM1,048 citations99
US4657845AApr 14, 1987
Positive tone oxygen plasma developable photoresist
IBM120 citations96
US4552833ANov 12, 1985
Radiation sensitive and oxygen plasma developable resist
IBM105 citations96
US5545509AAug 13, 1996
Photoresist composition with photosensitive base generator
IBM63 citations95
US4908298AMar 13, 1990
Method of creating patterned multilayer films for use in production of semiconductor circuits and systems
IBM108 citations95
US5250395AOct 5, 1993
Process for imaging of photoresist including treatment of the photoresist with an organometallic compound
IBM34 citations92
US5055439AOct 8, 1991
Photoacid generating composition and sensitizer therefor
IBM34 citations92
US4810601AMar 7, 1989
Top imaged resists
IBM50 citations92
US4767723AAug 30, 1988
Process for making self-aligning thin film transistors
IBM37 citations92
US4458994AJul 10, 1984
High resolution optical lithography method and apparatus having excimer laser light source and stimulated Raman shifting
IBM45 citations92
US5322765AJun 21, 1994
Dry developable photoresist compositions and method for use thereof
IBM47 citations91
US4464460AAug 7, 1984
Process for making an imaged oxygen-reactive ion etch barrier
IBM27 citations91
US4397937AAug 9, 1983
Positive resist compositions
IBM38 citations91
US4551418ANov 5, 1985
Process for preparing negative relief images with cationic photopolymerization
IBM24 citations81
US4284706AAug 18, 1981
Lithographic resist composition for a lift-off process
IBM25 citations81
US4800152AJan 24, 1989
Negative resist compositions
IBM6 citations74
US4853315AAug 1, 1989
O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists
IBM13 citations73
US4690838ASep 1, 1987
Process for enhancing the resistance of a resist image to reactive ion etching and to thermal flow
IBM12 citations73
US4601969AJul 22, 1986
High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution
IBM12 citations72
US4522911AJun 11, 1985
Deep ultra-violet lithographic resists with diazohomotetramic acid compounds
IBM16 citations72
US4645338AFeb 24, 1987
Optical system for focus correction for a lithographic tool
IBM18 citations70
US4398001AAug 9, 1983
Terpolymer resist compositions
IBM17 citations70
US5270151ADec 14, 1993
Spin on oxygen reactive ion etch barrier
IBM6 citations62