P

Inventor

WEI HSIAO-KUAN

TW22 patents

Patents

22 patents
US10790142B2Sep 29, 2020

Selective capping processes and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations83
US10770288B2Sep 8, 2020

Selective capping processes and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD9 citations83
US11024505B2Jun 1, 2021

Gate structure passivating species drive-in method and structure formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations82
US10854459B2Dec 1, 2020

Gate structure passivating species drive-in method and structure formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations82
US11380542B2Jul 5, 2022

Selective capping processes and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US9679984B2Jun 13, 2017

Metal gate structure with multi-layer composition

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11710638B2Jul 25, 2023

Gate structure passivating species drive-in method and structure formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US11830742B2Nov 28, 2023

Selective capping processes and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11211465B2Dec 28, 2021

Semiconductor device having gate dielectric and inhibitor film over gate dielectric

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10998414B2May 4, 2021

Metal gate structure with multi-layer composition

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12354876B2Jul 8, 2025

Gate structure passivating species drive-in method and structure formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12294022B2May 6, 2025

Semiconductor device and method of manufacturing the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11721740B2Aug 8, 2023

Semiconductor device and method of manufacturing the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11088257B2Aug 10, 2021

Semiconductor device and method of manufacturing the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10510854B2Dec 17, 2019

Semiconductor device having gate body and inhibitor film between conductive prelayer over gate body and conductive layer over inhibitor film

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10014382B2Jul 3, 2018

Semiconductor device with sidewall passivation and method of making

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US11201227B2Dec 14, 2021

Gate structure with barrier layer and method for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US11145747B2Oct 12, 2021

FinFET structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10707318B2Jul 7, 2020

Semiconductor device and method of manufacturing the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US12514130B2Dec 30, 2025

Magneto-resistive random-access memory (MRAM) devices and methods of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US10515807B1Dec 24, 2019

Methods of fabricating semiconductor devices with metal-gate work-function tuning layers

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
US12363924B2Jul 15, 2025

Semiconductor devices and methods for fabrication thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations43