Inventor
LEE GEUN SU
KR96 patents
⚠️ This page may combine multiple inventors who share the name “LEE GEUN SU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HYUNDAI ELECTRONICS IND
26 patentsUS6811960B2Nov 2, 2004
Partially crosslinked polymer for bilayer photoresist
HYUNDAI ELECTRONICS IND467 citations99
US6589707B2Jul 8, 2003
Partially crosslinked polymer for bilayer photoresist
HYUNDAI ELECTRONICS IND485 citations99
US6455225B1Sep 24, 2002
Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same
HYUNDAI ELECTRONICS IND465 citations99
US6316162B1Nov 13, 2001
Polymer and a forming method of a micro pattern using the same
HYUNDAI ELECTRONICS IND482 citations99
US6225020B1May 1, 2001
Polymer and a forming method of a micro pattern using the same
HYUNDAI ELECTRONICS IND508 citations99
US6150069ANov 21, 2000
Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same
HYUNDAI ELECTRONICS IND50 citations96
US6489432B2Dec 3, 2002
Organic anti-reflective coating polymer and preparation thereof
HYUNDAI ELECTRONICS IND25 citations93
US6410670B1Jun 25, 2002
Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
HYUNDAI ELECTRONICS IND16 citations93
US6265130B1Jul 24, 2001
Photoresist polymers of carboxyl-containing alicyclic compounds
HYUNDAI ELECTRONICS IND16 citations93
US6235448B1May 22, 2001
Photoresist monomers, polymers thereof, and photoresist compositions containing the same
HYUNDAI ELECTRONICS IND32 citations93
US6235447B1May 22, 2001
Photoresist monomers, polymers thereof, and photoresist compositions containing the same
HYUNDAI ELECTRONICS IND38 citations93
US6426171B1Jul 30, 2002
Photoresist monomer, polymer thereof and photoresist composition containing it
HYUNDAI ELECTRONICS IND16 citations84
US6403281B1Jun 11, 2002
Cross-linker monomer comprising double bond and photoresist copolymer containing the same
HYUNDAI ELECTRONICS IND17 citations84
US6391518B1May 21, 2002
Polymers and photoresist compositions using the same
HYUNDAI ELECTRONICS IND17 citations84
US6291131B1Sep 18, 2001
Monomers for photoresist, polymers thereof, and photoresist compositions using the same
HYUNDAI ELECTRONICS IND18 citations84
US6548613B2Apr 15, 2003
Organic anti-reflective coating polymer and preparation thereof
HYUNDAI ELECTRONICS IND8 citations74
US6537724B1Mar 25, 2003
Photoresist composition for resist flow process, and process for forming contact hole using the same
HYUNDAI ELECTRONICS IND9 citations74
US6465147B1Oct 15, 2002
Cross-linker for photoresist, and process for forming a photoresist pattern using the same
HYUNDAI ELECTRONICS IND10 citations74
US6455226B1Sep 24, 2002
Photoresist polymers and photoresist composition containing the same
HYUNDAI ELECTRONICS IND9 citations74
US6448352B1Sep 10, 2002
Photoresist monomer, polymer thereof and photoresist composition containing it
HYUNDAI ELECTRONICS IND6 citations74
US6416926B1Jul 9, 2002
Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same
HYUNDAI ELECTRONICS IND8 citations74
US6399272B1Jun 4, 2002
Phenylenediamine derivative-type additive useful for a chemically amplified photoresist
HYUNDAI ELECTRONICS IND11 citations74
US6387589B1May 14, 2002
Photoresist polymers and photoresist compositions containing the same
HYUNDAI ELECTRONICS IND11 citations74
US6368771B1Apr 9, 2002
Photoresist polymers and photoresist compositions containing the same
HYUNDAI ELECTRONICS IND9 citations74
US6368770B1Apr 9, 2002
Photoresist monomers, polymers thereof, and photoresist compositions containing the same
HYUNDAI ELECTRONICS IND12 citations74
US6200731B1Mar 13, 2001
Photoresist cross-linking monomers, photoresist polymers and photoresist compositions comprising the same
HYUNDAI ELECTRONICS IND11 citations74
HYNIX SEMICONDUCTOR INC
21 patentsUS7467632B2Dec 23, 2008
Method for forming a photoresist pattern
HYNIX SEMICONDUCTOR INC480 citations99
US7399570B2Jul 15, 2008
Water-soluble negative photoresist polymer and composition containing the same
HYNIX SEMICONDUCTOR INC463 citations99
US7238653B2Jul 3, 2007
Cleaning solution for photoresist and method for forming pattern using the same
HYNIX SEMICONDUCTOR INC464 citations98
US6692891B2Feb 17, 2004
Photoresist composition containing photo radical generator with photoacid generator
HYNIX SEMICONDUCTOR INC60 citations96
US6569599B2May 27, 2003
Partially crosslinked polymer for bilayer photoresist
HYNIX SEMICONDUCTOR INC17 citations84
US6984482B2Jan 10, 2006
Top-coating composition for photoresist and process for forming fine pattern using the same
HYNIX SEMICONDUCTOR INC6 citations74
US6824951B2Nov 30, 2004
Photoresist composition for resist flow process
HYNIX SEMICONDUCTOR INC7 citations74
US6818376B2Nov 16, 2004
Cross-linker monomer comprising double bond and photoresist copolymer containing the same
HYNIX SEMICONDUCTOR INC7 citations74
US6686123B2Feb 3, 2004
Photoresist monomer, polymer thereof and photoresist composition containing the same
HYNIX SEMICONDUCTOR INC10 citations74
US6653047B2Nov 25, 2003
Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same
HYNIX SEMICONDUCTOR INC10 citations74
US6486283B2Nov 26, 2002
Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof
HYNIX SEMICONDUCTOR INC11 citations74
US7615338B2Nov 10, 2009
Photoresist coating composition and method for forming fine pattern using the same
HYNIX SEMICONDUCTOR INC2 citations63
US7390611B2Jun 24, 2008
Photoresist coating composition and method for forming fine pattern using the same
HYNIX SEMICONDUCTOR INC6 citations63
US7150961B2Dec 19, 2006
Additive for photoresist composition for resist flow process
HYNIX SEMICONDUCTOR INC4 citations63
US7033732B2Apr 25, 2006
Method of preparing anti-reflective coating polymer and anti-reflecting coating composition comprising an anti-reflecting coating polymer
HYNIX SEMICONDUCTOR INC2 citations63
US6858371B2Feb 22, 2005
Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same
HYNIX SEMICONDUCTOR INC5 citations63
US6806025B2Oct 19, 2004
Photoresist monomers, polymers thereof and photoresist compositons containing the same
HYNIX SEMICONDUCTOR INC3 citations63
US6770414B2Aug 3, 2004
Additive for photoresist composition for resist flow process
HYNIX SEMICONDUCTOR INC3 citations63
US6753128B2Jun 22, 2004
Photoresist additive for preventing acid migration and photoresist composition comprising the same
HYNIX SEMICONDUCTOR INC4 citations63
US6749990B2Jun 15, 2004
Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same
HYNIX SEMICONDUCTOR INC2 citations63
US6720129B2Apr 13, 2004
Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same
HYNIX SEMICONDUCTOR INC3 citations63
DONGJIN SEMICHEM CO LTD
1 patentSK HYNIX INC
1 patentHYNIX SEMICONDUCTOR
1 patentShowing the top 50 of 96 patents by PatentIndex Score.