Inventor

JUNG JAE CHANG

KR155 patents

⚠️ This page may combine multiple inventors who share the name “JUNG JAE CHANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

JUNG JAE CHANG

HYUNDAI ELECTRONICS IND

Partially crosslinked polymer for bilayer photoresist

Partially crosslinked polymer for bilayer photoresist

Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same

Polymer and a forming method of a micro pattern using the same

Polymer and a forming method of a micro pattern using the same

Polymers for photoresist and photoresist compositions using the same

ArF photoresist copolymers

Polymers for photoresist and photoresist compositions using the same

Photoresist cross-linker and photoresist composition comprising the same

Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same

ArF photoresist copolymers

Polymer-containing photoresist, and process for manufacturing the same

Organic anti-reflective coating polymer and preparation thereof

Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same

Photoresist composition containing photo base generator with photo acid generator

Copolymer resin, preparation thereof, and photoresist using the same

Semiconductor device using polymer-containing photoresist, and process for manufacturing the same

Photoresist polymers of carboxyl-containing alicyclic compounds

Photoresist monomers, polymers thereof, and photoresist compositions containing the same

Photoresist monomers, polymers thereof, and photoresist compositions containing the same

Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin

Method and photoresist using a photoresist copolymer

Copolymer resin of maleimide and alicyclic olefin-based monomers, photoresist containing the copolymer resin and the preparation thereof

Photoresist composition for resist flow process and process for forming a contact hole using the same

Process for forming a photoresist pattern by top surface imaging process

Amide- or imide-introduced copolymer, preparation thereof and a photoresist comprising the same

Method and device using ArF photoresist

Over-coating composition for photoresist, and processes for forming photoresist patterns using the same

Photoresist monomer, polymer thereof and photoresist composition containing it

Cross-linker monomer comprising double bond and photoresist copolymer containing the same

Polymers and photoresist compositions using the same

Photoresist cross-linker and photoresist composition comprising the same

Monomers for photoresist, polymers thereof, and photoresist compositions using the same

Method for forming photoresist film pattern

HYNIX SEMICONDUCTOR INC

Photoresist polymer and photoresist composition containing the same

Overcoating composition for photoresist and method for forming photoresist pattern using the same

Photoresist composition containing photo radical generator with photoacid generator

Method for forming a fine pattern of a semiconductor device

Method of forming fine pattern of semiconductor device

Method for forming fine pattern of semiconductor device

Method for forming fine pattern of semiconductor device

Light absorbent agent polymer for organic anti-reflective coating and preparation method and organic anti-reflective coating composition comprising the same

Organic anti-reflective coating composition and method for forming photoresist patterns using the same

Partially crosslinked polymer for bilayer photoresist

Composition for an organic hard mask and method for forming a pattern on a semiconductor device using the same

Photoresist composition for EUV and method for forming photoresist pattern using the same

Top-coating composition for photoresist and process for forming fine pattern using the same

Photoresist composition for resist flow process

DONGJIN SEMICHEM CO LTD

Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion

JUNG JAE CHANG

Method for forming a fine pattern in a semicondutor device