P

Inventor

BAIK KI HO

KR91 patents
⚠️ This page may combine multiple inventors who share the name “BAIK KI HO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HYUNDAI ELECTRONICS IND

43 patents
US6811960B2Nov 2, 2004

Partially crosslinked polymer for bilayer photoresist

HYUNDAI ELECTRONICS IND467 citations99
US6589707B2Jul 8, 2003

Partially crosslinked polymer for bilayer photoresist

HYUNDAI ELECTRONICS IND485 citations99
US6455225B1Sep 24, 2002

Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same

HYUNDAI ELECTRONICS IND465 citations99
US6316162B1Nov 13, 2001

Polymer and a forming method of a micro pattern using the same

HYUNDAI ELECTRONICS IND482 citations99
US6225020B1May 1, 2001

Polymer and a forming method of a micro pattern using the same

HYUNDAI ELECTRONICS IND508 citations99
US6866984B2Mar 15, 2005

ArF photoresist copolymers

HYUNDAI ELECTRONICS IND88 citations98
US6368773B1Apr 9, 2002

Photoresist cross-linker and photoresist composition comprising the same

HYUNDAI ELECTRONICS IND473 citations98
US6150069ANov 21, 2000

Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same

HYUNDAI ELECTRONICS IND50 citations96
US6132926AOct 17, 2000

ArF photoresist copolymers

HYUNDAI ELECTRONICS IND79 citations96
US6632903B2Oct 14, 2003

Polymer-containing photoresist, and process for manufacturing the same

HYUNDAI ELECTRONICS IND31 citations93
US6489432B2Dec 3, 2002

Organic anti-reflective coating polymer and preparation thereof

HYUNDAI ELECTRONICS IND25 citations93
US6410670B1Jun 25, 2002

Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same

HYUNDAI ELECTRONICS IND16 citations93
US6395451B1May 28, 2002

Photoresist composition containing photo base generator with photo acid generator

HYUNDAI ELECTRONICS IND48 citations93
US6369181B1Apr 9, 2002

Copolymer resin, preparation thereof, and photoresist using the same

HYUNDAI ELECTRONICS IND22 citations93
US6312865B1Nov 6, 2001

Semiconductor device using polymer-containing photoresist, and process for manufacturing the same

HYUNDAI ELECTRONICS IND24 citations93
US6265130B1Jul 24, 2001

Photoresist polymers of carboxyl-containing alicyclic compounds

HYUNDAI ELECTRONICS IND16 citations93
US6235447B1May 22, 2001

Photoresist monomers, polymers thereof, and photoresist compositions containing the same

HYUNDAI ELECTRONICS IND38 citations93
US6235448B1May 22, 2001

Photoresist monomers, polymers thereof, and photoresist compositions containing the same

HYUNDAI ELECTRONICS IND32 citations93
US6165672ADec 26, 2000

Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin

HYUNDAI ELECTRONICS IND24 citations93
US6143463ANov 7, 2000

Method and photoresist using a photoresist copolymer

HYUNDAI ELECTRONICS IND28 citations93
US5830624ANov 3, 1998

Method for forming resist patterns comprising two photoresist layers and an intermediate layer

HYUNDAI ELECTRONICS IND42 citations93
US6395397B2May 28, 2002

Organic anti-reflective coating polymer and preparation thereof

HYUNDAI ELECTRONICS IND23 citations92
US6388039B1May 14, 2002

Organic anti-reflective polymer and method for manufacturing thereof

HYUNDAI ELECTRONICS IND23 citations92
US6368768B1Apr 9, 2002

Organic anti-reflective coating material and its preparation

HYUNDAI ELECTRONICS IND26 citations92
US6350818B1Feb 26, 2002

Anti reflective coating polymers and the preparation method thereof

HYUNDAI ELECTRONICS IND16 citations92
US6319654B1Nov 20, 2001

Process for forming a photoresist pattern by top surface imaging process

HYUNDAI ELECTRONICS IND23 citations92
US6316151B1Nov 13, 2001

Stencil mask

HYUNDAI ELECTRONICS IND22 citations92
US6309790B1Oct 30, 2001

Organic anti-reflective coating material and its preparation

HYUNDAI ELECTRONICS IND40 citations92
US5821034AOct 13, 1998

Method for forming micro patterns of semiconductor devices

HYUNDAI ELECTRONICS IND19 citations88
US6764806B2Jul 20, 2004

Over-coating composition for photoresist, and processes for forming photoresist patterns using the same

HYUNDAI ELECTRONICS IND17 citations84
US6492441B2Dec 10, 2002

Anti reflective coating polymers and the preparation method thereof

HYUNDAI ELECTRONICS IND15 citations84
US6426171B1Jul 30, 2002

Photoresist monomer, polymer thereof and photoresist composition containing it

HYUNDAI ELECTRONICS IND16 citations84
US6403281B1Jun 11, 2002

Cross-linker monomer comprising double bond and photoresist copolymer containing the same

HYUNDAI ELECTRONICS IND17 citations84
US6391518B1May 21, 2002

Polymers and photoresist compositions using the same

HYUNDAI ELECTRONICS IND17 citations84
US6322948B1Nov 27, 2001

Photoresist cross-linker and photoresist composition comprising the same

HYUNDAI ELECTRONICS IND15 citations84
US6291131B1Sep 18, 2001

Monomers for photoresist, polymers thereof, and photoresist compositions using the same

HYUNDAI ELECTRONICS IND18 citations84
US6548613B2Apr 15, 2003

Organic anti-reflective coating polymer and preparation thereof

HYUNDAI ELECTRONICS IND8 citations74
US6537724B1Mar 25, 2003

Photoresist composition for resist flow process, and process for forming contact hole using the same

HYUNDAI ELECTRONICS IND9 citations74
US6489423B2Dec 3, 2002

Organic anti-reflective polymer and method for manufacturing thereof

HYUNDAI ELECTRONICS IND6 citations74
US6465147B1Oct 15, 2002

Cross-linker for photoresist, and process for forming a photoresist pattern using the same

HYUNDAI ELECTRONICS IND10 citations74
US6455226B1Sep 24, 2002

Photoresist polymers and photoresist composition containing the same

HYUNDAI ELECTRONICS IND9 citations74
US6448352B1Sep 10, 2002

Photoresist monomer, polymer thereof and photoresist composition containing it

HYUNDAI ELECTRONICS IND6 citations74
US6416926B1Jul 9, 2002

Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same

HYUNDAI ELECTRONICS IND8 citations74

HYNIX SEMICONDUCTOR INC

7 patents

Showing the top 50 of 91 patents by PatentIndex Score.