Inventor
BAIK KI HO
KR91 patents
⚠️ This page may combine multiple inventors who share the name “BAIK KI HO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HYUNDAI ELECTRONICS IND
43 patentsUS6811960B2Nov 2, 2004
Partially crosslinked polymer for bilayer photoresist
HYUNDAI ELECTRONICS IND467 citations99
US6589707B2Jul 8, 2003
Partially crosslinked polymer for bilayer photoresist
HYUNDAI ELECTRONICS IND485 citations99
US6455225B1Sep 24, 2002
Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same
HYUNDAI ELECTRONICS IND465 citations99
US6316162B1Nov 13, 2001
Polymer and a forming method of a micro pattern using the same
HYUNDAI ELECTRONICS IND482 citations99
US6225020B1May 1, 2001
Polymer and a forming method of a micro pattern using the same
HYUNDAI ELECTRONICS IND508 citations99
US6866984B2Mar 15, 2005
ArF photoresist copolymers
HYUNDAI ELECTRONICS IND88 citations98
US6368773B1Apr 9, 2002
Photoresist cross-linker and photoresist composition comprising the same
HYUNDAI ELECTRONICS IND473 citations98
US6150069ANov 21, 2000
Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same
HYUNDAI ELECTRONICS IND50 citations96
US6132926AOct 17, 2000
ArF photoresist copolymers
HYUNDAI ELECTRONICS IND79 citations96
US6632903B2Oct 14, 2003
Polymer-containing photoresist, and process for manufacturing the same
HYUNDAI ELECTRONICS IND31 citations93
US6489432B2Dec 3, 2002
Organic anti-reflective coating polymer and preparation thereof
HYUNDAI ELECTRONICS IND25 citations93
US6410670B1Jun 25, 2002
Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
HYUNDAI ELECTRONICS IND16 citations93
US6395451B1May 28, 2002
Photoresist composition containing photo base generator with photo acid generator
HYUNDAI ELECTRONICS IND48 citations93
US6369181B1Apr 9, 2002
Copolymer resin, preparation thereof, and photoresist using the same
HYUNDAI ELECTRONICS IND22 citations93
US6312865B1Nov 6, 2001
Semiconductor device using polymer-containing photoresist, and process for manufacturing the same
HYUNDAI ELECTRONICS IND24 citations93
US6265130B1Jul 24, 2001
Photoresist polymers of carboxyl-containing alicyclic compounds
HYUNDAI ELECTRONICS IND16 citations93
US6235447B1May 22, 2001
Photoresist monomers, polymers thereof, and photoresist compositions containing the same
HYUNDAI ELECTRONICS IND38 citations93
US6235448B1May 22, 2001
Photoresist monomers, polymers thereof, and photoresist compositions containing the same
HYUNDAI ELECTRONICS IND32 citations93
US6165672ADec 26, 2000
Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin
HYUNDAI ELECTRONICS IND24 citations93
US6143463ANov 7, 2000
Method and photoresist using a photoresist copolymer
HYUNDAI ELECTRONICS IND28 citations93
US5830624ANov 3, 1998
Method for forming resist patterns comprising two photoresist layers and an intermediate layer
HYUNDAI ELECTRONICS IND42 citations93
US6395397B2May 28, 2002
Organic anti-reflective coating polymer and preparation thereof
HYUNDAI ELECTRONICS IND23 citations92
US6388039B1May 14, 2002
Organic anti-reflective polymer and method for manufacturing thereof
HYUNDAI ELECTRONICS IND23 citations92
US6368768B1Apr 9, 2002
Organic anti-reflective coating material and its preparation
HYUNDAI ELECTRONICS IND26 citations92
US6350818B1Feb 26, 2002
Anti reflective coating polymers and the preparation method thereof
HYUNDAI ELECTRONICS IND16 citations92
US6319654B1Nov 20, 2001
Process for forming a photoresist pattern by top surface imaging process
HYUNDAI ELECTRONICS IND23 citations92
US6316151B1Nov 13, 2001
Stencil mask
HYUNDAI ELECTRONICS IND22 citations92
US6309790B1Oct 30, 2001
Organic anti-reflective coating material and its preparation
HYUNDAI ELECTRONICS IND40 citations92
US5821034AOct 13, 1998
Method for forming micro patterns of semiconductor devices
HYUNDAI ELECTRONICS IND19 citations88
US6764806B2Jul 20, 2004
Over-coating composition for photoresist, and processes for forming photoresist patterns using the same
HYUNDAI ELECTRONICS IND17 citations84
US6492441B2Dec 10, 2002
Anti reflective coating polymers and the preparation method thereof
HYUNDAI ELECTRONICS IND15 citations84
US6426171B1Jul 30, 2002
Photoresist monomer, polymer thereof and photoresist composition containing it
HYUNDAI ELECTRONICS IND16 citations84
US6403281B1Jun 11, 2002
Cross-linker monomer comprising double bond and photoresist copolymer containing the same
HYUNDAI ELECTRONICS IND17 citations84
US6391518B1May 21, 2002
Polymers and photoresist compositions using the same
HYUNDAI ELECTRONICS IND17 citations84
US6322948B1Nov 27, 2001
Photoresist cross-linker and photoresist composition comprising the same
HYUNDAI ELECTRONICS IND15 citations84
US6291131B1Sep 18, 2001
Monomers for photoresist, polymers thereof, and photoresist compositions using the same
HYUNDAI ELECTRONICS IND18 citations84
US6548613B2Apr 15, 2003
Organic anti-reflective coating polymer and preparation thereof
HYUNDAI ELECTRONICS IND8 citations74
US6537724B1Mar 25, 2003
Photoresist composition for resist flow process, and process for forming contact hole using the same
HYUNDAI ELECTRONICS IND9 citations74
US6489423B2Dec 3, 2002
Organic anti-reflective polymer and method for manufacturing thereof
HYUNDAI ELECTRONICS IND6 citations74
US6465147B1Oct 15, 2002
Cross-linker for photoresist, and process for forming a photoresist pattern using the same
HYUNDAI ELECTRONICS IND10 citations74
US6455226B1Sep 24, 2002
Photoresist polymers and photoresist composition containing the same
HYUNDAI ELECTRONICS IND9 citations74
US6448352B1Sep 10, 2002
Photoresist monomer, polymer thereof and photoresist composition containing it
HYUNDAI ELECTRONICS IND6 citations74
US6416926B1Jul 9, 2002
Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same
HYUNDAI ELECTRONICS IND8 citations74
HYNIX SEMICONDUCTOR INC
7 patentsUS6692891B2Feb 17, 2004
Photoresist composition containing photo radical generator with photoacid generator
HYNIX SEMICONDUCTOR INC60 citations96
US6569599B2May 27, 2003
Partially crosslinked polymer for bilayer photoresist
HYNIX SEMICONDUCTOR INC17 citations84
US6984482B2Jan 10, 2006
Top-coating composition for photoresist and process for forming fine pattern using the same
HYNIX SEMICONDUCTOR INC6 citations74
US6824951B2Nov 30, 2004
Photoresist composition for resist flow process
HYNIX SEMICONDUCTOR INC7 citations74
US6818376B2Nov 16, 2004
Cross-linker monomer comprising double bond and photoresist copolymer containing the same
HYNIX SEMICONDUCTOR INC7 citations74
US6664031B2Dec 16, 2003
Process for forming photoresist pattern by using gas phase amine treatment
HYNIX SEMICONDUCTOR INC7 citations74
US6486283B2Nov 26, 2002
Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof
HYNIX SEMICONDUCTOR INC11 citations74
Showing the top 50 of 91 patents by PatentIndex Score.