Inventor

IWASA SHIGEYUKI

JP54 patents

⚠️ This page may combine multiple inventors who share the name “IWASA SHIGEYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IWASA SHIGEYUKI

NEC CORP

Photosensitive resin and method for patterning by use of the same

Photoresist, compounds for composing the photoresist, and method of forming pattern by using the photoresist

(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it

(Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it

Photosensitive resin and method for patterning by use of the same

Photosensitive resin composition useful as resist for deep UV lithography containing sulfonium salts

Alkylsulfonium salts and photoresist compositions containing the same

Sulfonium salt compound, photoresist composition and method for patterning by employing same

Monomer having diol structure, polymer thereof, and negative photoresist composition and pattern forming method using the same

Photosensitive resin composition and patterning method using the same

Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same

Negative type photoresist composition used for light beam with short wavelength and method of forming pattern using the same

Negative resist materials, pattern formation method making use thereof, and method of manufacturing semiconductor devices

Negative type photoresist composition used for light beam with short wavelength and method of forming pattern using the same

Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask

Sulfonium salts having bridged cyclic alkyl group useful as resist for deep UV lithography

Polymer having silicon atoms and sulfonium salt units and photoresist compositions containing the same

Monomer having vinyl group, polymer thereof and photosensitive resin including those

Alkylsulfonium salts and photoresist compositions containing the same

Secondary battery

Photoresist and compounds for composing the photoresist

Secondary battery with a radical compound active material

Electricity storage device

Electrode and battery using same

Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method

Sulfonium salt compound and resist composition and pattern forming method using the same

(Meth)acrylate, polymer, photoresist composition, and pattern forming process making use of the composition

Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same

(Meth)acrylate, polymer photoresist composition, and pattern forming process making use of the composition

Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask

(Meth)acrylate, polymer, photoresist composition, and pattern forming process making use of the composition

Si containing high molecular compound and photosensitive resin composition

Photoresist and compounds for composing the photoresist

(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it

Secondary battery having an active material radical compound

Secondary battery with a nitroxyl polymer active material

Secondary battery having radical compound electrode

Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions

Liquid crystal display unit and method for manufacturing the same

Method for forming resist pattern

Battery and battery electrode

Electrode active material and electrode using the electrode active material and battery using the electrode

Resist resin, chemical amplification type resist, and method of forming of pattern with the same

Battery having active material containing neutral carbon radical compound

Power storage device

SUGURO MASAHIRO

Process for producing polyradical compound and battery cell

Method for manufacturing polyradical compound and battery

KUSACHI YUKI

Polyradical compound-conductive material composite, method for producing the same, and battery using the same

NAKAHARA KENTARO

Electricity storage device

MAEDA KATSUMI

(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it