Inventor
OKUMURA KATSUYA
JP297 patents
⚠️ This page may combine multiple inventors who share the name “OKUMURA KATSUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
41 patentsUS6809421B1Oct 26, 2004
Multichip semiconductor device, chip therefor and method of formation thereof
TOSHIBA KK496 citations99
US6239495B1May 29, 2001
Multichip semiconductor device and memory card
TOSHIBA KK209 citations99
US6071810AJun 6, 2000
Method of filling contact holes and wiring grooves of a semiconductor device
TOSHIBA KK101 citations99
US5534106AJul 9, 1996
Apparatus for processing semiconductor wafers
TOSHIBA KK180 citations99
US5067437ANov 26, 1991
Apparatus for coating of silicon semiconductor surface
TOSHIBA KK360 citations99
US4807021AFeb 21, 1989
Semiconductor device having stacking structure
TOSHIBA KK426 citations99
US6740590B1May 25, 2004
Aqueous dispersion, aqueous dispersion for chemical mechanical polishing used for manufacture of semiconductor devices, method for manufacture of semiconductor devices, and method for formation of embedded writing
TOSHIBA KK102 citations98
US6504227B1Jan 7, 2003
Passive semiconductor device mounted as daughter chip on active semiconductor device
TOSHIBA KK91 citations98
US6454819B1Sep 24, 2002
Composite particles and production process thereof, aqueous dispersion, aqueous dispersion composition for chemical mechanical polishing, and process for manufacture of semiconductor device
TOSHIBA KK108 citations98
US6375545B1Apr 23, 2002
Chemical mechanical method of polishing wafer surfaces
TOSHIBA KK131 citations98
US6375823B1Apr 23, 2002
Plating method and plating apparatus
TOSHIBA KK96 citations98
US6335534B1Jan 1, 2002
Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processes
TOSHIBA KK81 citations98
US6334928B1Jan 1, 2002
Semiconductor processing system and method of using the same
TOSHIBA KK97 citations98
US6124189ASep 26, 2000
Metallization structure and method for a semiconductor device
TOSHIBA KK121 citations98
US6015990AJan 18, 2000
Semiconductor memory device and method of manufacturing the same
TOSHIBA KK109 citations98
US5538815AJul 23, 1996
Method for designing phase-shifting masks with automatization capability
TOSHIBA KK183 citations98
US5483568AJan 9, 1996
Pad condition and polishing rate monitor using fluorescence
TOSHIBA KK129 citations98
US5444207AAug 22, 1995
Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field
TOSHIBA KK132 citations98
US5429730AJul 4, 1995
Method of repairing defect of structure
TOSHIBA KK114 citations97
US5015330AMay 14, 1991
Film forming method and film forming device
TOSHIBA KK141 citations97
US6933234B2Aug 23, 2005
Method for manufacturing semiconductor device and polishing apparatus
TOSHIBA KK50 citations96
US6673704B2Jan 6, 2004
Semiconductor device and method of manufacturing the same
TOSHIBA KK42 citations96
US6614033B2Sep 2, 2003
Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processes
TOSHIBA KK71 citations96
US6566632B1May 20, 2003
Hot plate and semiconductor device manufacturing method using the same
TOSHIBA KK59 citations96
US6316163B1Nov 13, 2001
Pattern forming method
TOSHIBA KK57 citations96
US6291891B1Sep 18, 2001
Semiconductor device manufacturing method and semiconductor device
TOSHIBA KK69 citations96
US6268641B1Jul 31, 2001
Semiconductor wafer having identification indication and method of manufacturing the same
TOSHIBA KK51 citations96
US6265323B1Jul 24, 2001
Substrate processing method and apparatus
TOSHIBA KK54 citations96
US6231917B1May 15, 2001
Method of forming liquid film
TOSHIBA KK49 citations96
US6072162AJun 6, 2000
Device and method for heating substrate, and method for treating substrate
TOSHIBA KK66 citations96
US5998100ADec 7, 1999
Fabrication process using a multi-layer antireflective layer
TOSHIBA KK89 citations96
US5989759ANov 23, 1999
Pattern forming method using alignment from latent image or base pattern on substrate
TOSHIBA KK41 citations96
US5807650ASep 15, 1998
Photo mask and apparatus for repairing photo mask
TOSHIBA KK57 citations96
US5759746AJun 2, 1998
Fabrication process using a thin resist
TOSHIBA KK75 citations96
US5721173AFeb 24, 1998
Method of forming a shallow trench isolation structure
TOSHIBA KK76 citations96
US5679610AOct 21, 1997
Method of planarizing a semiconductor workpiece surface
TOSHIBA KK59 citations96
US5660744AAug 26, 1997
Plasma generating apparatus and surface processing apparatus
TOSHIBA KK65 citations96
US5639699AJun 17, 1997
Focused ion beam deposition using TMCTS
TOSHIBA KK62 citations96
US5605574AFeb 25, 1997
Semiconductor wafer support apparatus and method
TOSHIBA KK51 citations96
US5415191AMay 16, 1995
Arrangement for cleaning semiconductor wafers using mixer
TOSHIBA KK116 citations96
US5399860AMar 21, 1995
Electron optic column and scanning electron microscope
TOSHIBA KK52 citations96
TOKYO ELECTRON LTD
4 patentsUS5637153AJun 10, 1997
Method of cleaning reaction tube and exhaustion piping system in heat processing apparatus
TOKYO ELECTRON LTD351 citations98
US7023226B2Apr 4, 2006
Probe pins zero-point detecting method, and prober
TOKYO ELECTRON LTD111 citations97
US5968268AOct 19, 1999
Coating apparatus and coating method
TOKYO ELECTRON LTD61 citations96
US5539179AJul 23, 1996
Electrostatic chuck having a multilayer structure for attracting an object
TOKYO ELECTRON LTD96 citations96
EBARA CORP
3 patentsUS6632335B2Oct 14, 2003
Plating apparatus
EBARA CORP114 citations97
US5885138AMar 23, 1999
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
EBARA CORP75 citations97
US6354907B1Mar 12, 2002
Polishing apparatus including attitude controller for turntable and/or wafer carrier
EBARA CORP58 citations96
TOKYO SHIBAURA ELECTRIC CO
1 patentKABUSHKI KAISHA TOSHIBA
1 patentShowing the top 50 of 297 patents by PatentIndex Score.