Inventor

SHIH HONG

US82 patents

⚠️ This page may combine multiple inventors who share the name “SHIH HONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHIH HONG

LAM RES CORP

Wet cleaning of electrostatic chucks

Silicon electrode assembly surface decontamination by acidic solution

Cleaning methods for silicon electrode assembly surface contamination removal

Methods and apparatus for wet cleaning electrode assemblies for plasma processing apparatuses

Method for cleaning microwave applicator tube

Cleaning methods for silicon electrode assembly surface contamination removal

Dense oxide coated component of a plasma processing chamber and method of manufacture thereof

Methodology for cleaning of surface metal contamination from electrode assemblies

Methods for silicon electrode assembly etch rate and etch uniformity recovery

Coating system and method for coating interior fluid wetted surfaces of a component of a semiconductor substrate processing apparatus

Conditioning chamber component

Dense oxide coated component of a plasma processing chamber and method of manufacture thereof

Bare aluminum baffles for resist stripping chambers

Method of removing damaged epoxy from electrostatic chuck

Corrosion resistant aluminum coating on plasma chamber components

Electrostatic chuck cleaning fixture

Method for inspecting electrostatic chucks with Kelvin probe analysis

Method to selectively pattern a surface for plasma resistant coat applications

Extending storage time of removed plasma chamber components prior to cleaning thereof

Conditioning chamber component

Conditioning chamber component

APPLIED MATERIALS INC

Boron carbide parts and coatings in a plasma reactor

Diamond coated parts in a plasma reactor

Ceramic composition for an apparatus and method for processing a substrate

Ceramic composition for an apparatus and method for processing a substrate

Method of cleaning a semiconductor device processing chamber after a copper etch process

Process chamber component having electroplated yttrium containing coating

Substrate processing using a member comprising an oxide of a group IIIB metal

Corrosion-resistant protective coating for an apparatus and method for processing a substrate

Wavy and roughened dome in plasma processing reactor

Method for monitoring the quality of a protective coating in a reactor chamber

Methods for etching an organic anti-reflective coating

Electroplating an yttrium-containing coating on a chamber component

Method for recovering metal from etch by-products

SHIH HONG

Coating boron carbide on aluminum

On-line chamber cleaning using dry ice blasting

Actively heated aluminum baffle component having improved particle performance and methods of use and manufacture thereof

Methodology for cleaning of surface metal contamination from an upper electrode used in a plasma chamber

Extending lifetime of yttrium oxide as a plasma chamber material

Extending lifetime of yttrium oxide as a plasma chamber material

AVOYAN ARMEN

Electrode transporter and fixture sets incorporating the same

Processes for reconditioning multi-component electrodes

Immersive oxidation and etching process for cleaning silicon electrodes

(unassigned)

Process chamber having component with yttrium-aluminum coating

HAN NIANCI

Process chamber component having yttrium—aluminum coating

UNIV SOUTHERN CALIFORNIA

Method for creating a corrosion-resistant aluminum surface

FMC CORP

Method and apparatus for determining the quality of a coating

AUGUSTINO JASON

Backside mounted electrode carriers and assemblies incorporating the same

EGLEY FRED D

Bare aluminum baffles for resist stripping chambers

APPLEID MATERIALS INC

Fluorine free integrated process for etching aluminum including chamber dry clean