Extending storage time of removed plasma chamber components prior to cleaning thereof

Abstract

A method of extending storage time prior to cleaning a component of a plasma chamber is provided. The method comprises removing the component from the chamber, covering a thermal spray coating on the component while the surface is exposed to atmospheric air, storing the component, optionally removing the covering, and optionally wet cleaning reaction by-products from the thermal spray coating. Alternatively, instead of, or in addition to covering a thermal spray coating on the component, the component can be placed into a desiccator or dry-box.

1. A method of extending storage time prior to cleaning a component of a plasma chamber, the method comprising:
 removing the component from the chamber wherein the component has undergone a plasma operation during which reaction by-products were deposited on a thermal spray coating of the component; 
 covering a surface of the thermal spray coating on the component with a substantially impermeable adhesive polymer sheet, and wherein the substantially impermeable adhesive polymer sheet is applied outwardly of a periphery of the surface of the thermal spray coating to prevent exposure of the surface of the thermal spray coating to atmospheric air; and 
 storing the component for later cleaning of the reaction by-products from the thermal spray coating. 
 
     
     
       2. The method of  claim 1 , wherein the substantially impermeable adhesive polymer sheet is a moisture impermeable material. 
     
     
       3. The method of  claim 1 , wherein covering the thermal spray coating of the component is accomplished within 5 minutes from exposing the chamber and components to atmospheric air. 
     
     
       4. The method of  claim 1 , wherein the component is removed at a temperature above 50° C. and the polymer sheet is applied while the component is at a temperature above 50° C. 
     
     
       5. The method of  claim 1 , wherein the thermal spray coating consists essentially of yttria. 
     
     
       6. The method of  claim 1 , wherein the thermal spray coating consists essentially of alumina. 
     
     
       7. The method of  claim 1 , wherein the thermal spray coating is on an underlying material selected from the group consisting of aluminum, anodized aluminum, alumina and a ceramic. 
     
     
       8. The method of  claim 1 , wherein the plasma chamber is a plasma etch chamber. 
     
     
       9. The method of  claim 1 , wherein the component is stored for at least 4 hours. 
     
     
       10. The method of  claim 1 , further comprising:
 removing the polymer sheet from the thermal spray coating; and 
 performing a wet cleaning process in which the reaction by-products are removed from the thermal spray coating. 
 
     
     
       11. The method of  claim 1 , further comprising cleaning the reaction by-products from the thermal spray coating without removing the thermal spray coating and reinstalling the component in the chamber. 
     
     
       12. The method of  claim 1 , further comprising:
 removing the polymer sheet from the thermal spray coating; 
 cleaning the component without removing the thermal spray coating; and 
 reinstalling the component in a second plasma chamber. 
 
     
     
       13. The method of  claim 1 , wherein the component comprises a dielectric window. 
     
     
       14. The method of  claim 1 , wherein the component comprises a baffle. 
     
     
       15. The method of  claim 1 , wherein the component is selected from the group consisting of: electrostatic chucks, disks, rings, liners, injectors, substrate supports, and gas distribution plates. 
     
     
       16. The method of  claim 1 , further comprising applying the substantially impermeable adhesive polymer sheet outwardly of the periphery of the thermal spray coating without contacting the thermal spray coating. 
     
     
       17. A method of extending storage time prior to cleaning a component of a plasma etch chamber, the method comprising:
 removing the component from the chamber wherein the component has undergone a plasma operation during which reaction by-products were deposited on a thermal spray coating of the component; 
 covering the thermal spray coated component of the plasma etch chamber with a moisture impermeable material while exposed to atmospheric air to prevent plasma reaction by-products from reacting with moisture in the atmospheric air; 
 sealing the moisture impermeable material outwardly of a periphery of the thermal spray coating to prevent exposure of the surface of the thermal spray coating to atmospheric air; 
 storing the thermal spray coated component for at least one day with the moisture impermeable material for later cleaning of the reaction by-products from the thermal spray coating; 
 removing the covering from the thermal spray coating; and 
 performing a wet cleaning process in which the reaction by-products are removed from the thermal spray coating without removing the thermal spray coating. 
 
     
     
       18. The method of  claim 17 , wherein the covering is applied on the thermal spray coated component while the thermal spray coated component is at a temperature above 50° C. from a plasma etch operation. 
     
     
       19. A method of extending storage time prior to cleaning a component of a plasma etch chamber, the method comprising:
 performing a plasma etch operation during which etch by-products are deposited on a thermal spray coating on the component; 
 removing the component from the chamber; 
 covering the thermal spray coating on the component with a moisture impermeable material, and wherein the moisture impermeable material is applied outwardly of a periphery of the thermal spray coating to prevent the etch by-products from reacting with moisture in the atmospheric air; 
 storing the component for later cleaning of the etch by-products from the thermal spray coating; 
 removing the covering from the thermal spray coating; and 
 performing a wet cleaning process in which the etch by-products are removed from the thermal spray coating. 
 
     
     
       20. A method of extending storage time prior to cleaning a component of a plasma chamber, the method comprising:
 removing the component from the chamber wherein the component has undergone a plasma operation during which reaction by-products were deposited on a thermal spray coating of the component; 
 covering a surface of the thermal spray coating on the component with electroplating tape, which adheres to surfaces of the component not covered with the thermal spray coating while not adhering the tape to the thermal spray coating; and 
 storing the component for later cleaning of the reaction by-products from the thermal spray coating.