Inventor · disambiguated record
Toshiharu Hirata
Also filed as: HIRATA TOSHIHARU
14 granted patents·3 pending applications·26 citations·filing 2005–2023
87Inventor score
Top patents by PatentIndex Score
17 records- 0184US10468237B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Nov 5, 2019·3 cites·6 claims
- 0281US10049860B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Aug 14, 2018·4 cites·9 claims
- 0380US8834631B2Processing apparatus and valve operation checking methodTOKYO ELECTRON LTD·Filed 2013·Granted Sep 16, 2014·5 cites·13 claims
- 0478US11086286B2Substrate processing system, substrate processing method, and control programTOKYO ELECTRON LTD·Filed 2019·Granted Aug 10, 2021·3 cites·15 claims
- 0570US8537526B2Cylindrical capacitor employing electrolyte solutionSHIMIZU TOSHIAKI·Filed 2009·Granted Sep 17, 2013·3 cites·8 claims
- 0670US7972649B2Thin film forming method and thin film forming apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Jul 5, 2011·4 cites·20 claims
- 0768US11127615B2Substrate processing system and substrate transfer methodTOKYO ELECTRON LTD·Filed 2019·Granted Sep 21, 2021·1 cites·19 claims
- 0859US2023026807A1Semiconductor manufacturing apparatus, condition compensation method, and programTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0956US9708711B2Processing apparatus and process status checking methodTOKYO ELECTRON LTD·Filed 2013·Granted Jul 18, 2017·0 cites·4 claims
- 1056US2024213064A1Substrate processing system, control device, and substrate transfer processing methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1155US12362155B2Substrate processing apparatus, temperature control method of substrate processing apparatus, and program of control device for controlling substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jul 15, 2025·0 cites·7 claims
- 1255US11908712B2Semiconductor manufacturing apparatus, substrate transfer method, and programTOKYO ELECTRON LTD·Filed 2021·Granted Feb 20, 2024·0 cites·8 claims
- 1350US12062559B2Substrate processing system, substrate processing method, and control programTOKYO ELECTRON LTD·Filed 2021·Granted Aug 13, 2024·0 cites·12 claims
- 1449US12094700B2Film forming method, film forming apparatus, and programTOKYO ELECTRON LTD·Filed 2021·Granted Sep 17, 2024·0 cites·2 claims
- 1547US8310809B2Electric double layer capacitor and method for manufacturing sameKITAGAWA TOSHIYUKI·Filed 2007·Granted Nov 13, 2012·3 cites·32 claims
- 1638US2012014768A1Vacuum processing apparatusMIYASHITA TETSUYA·Filed 2011·Application pending·0 cites
- 1737US10273571B2Film forming systemTOKYO ELECTRON LTD·Filed 2016·Granted Apr 30, 2019·0 cites·5 claims
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