Inventor

BASCERI CEM

US288 patents

⚠️ This page may combine multiple inventors who share the name “BASCERI CEM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BASCERI CEM

MICRON TECHNOLOGY INC

Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces

Methods of forming a capacitor

Method of forming a capacitor

Deposition methods

Chemical vapor deposition method for depositing a high k dielectric film

MIM capacitor with metal nitride electrode materials and method of formation

Physical vapor deposition methods

Methods for forming conductive structures and structures regarding same

Chemical vapor deposition methods of forming a high K dielectric layer and methods of forming a capacitor

Dielectric cure for reducing oxygen vacancies

Methods of forming pluralities of capacitors

Methods for forming a conductive structure using oxygen diffusion through one metal layer to oxidize a second metal layer

Chemical vapor deposition methods of forming barium strontium titanate comprising dielectric layers, including such layers having a varied concentration of barium and strontium within the layer

Chemical vapor deposition methods of forming barium strontium titanate comprising dielectric layers, including such layers having a varied concentration of barium and strontium within the layer

Reactors having gas distributors and methods for depositing materials onto micro-device workpieces

Chemical vapor deposition methods of forming barium strontium titanate comprising dielectric layers

Method for controlling deposition of dielectric films

Atomic layer deposition methods

Methods for forming and integrated circuit structures containing ruthenium and tungsten containing layers

Deposition methods with time spaced and time abutting precursor pulses

Method of forming haze-free BST films

Methods of forming hafnium-containing materials, methods of forming hafnium oxide, and capacitor constructions comprising hafnium oxide

Methods of forming regions of differing composition over a substrate

Atomic layer deposition methods

Top electrode in a strongly oxidizing environment

Methods of depositing a layer comprising tungsten and methods of forming a transistor gate line

Method of forming a non-conformal layer over and exposing a trench

Method of etching a substantially amorphous TA2O5 comprising layer

Integrated capacitors fabricated with conductive metal oxides

Structures and methods for enhancing capacitors in integrated circuits

Methods of forming vertical transistor structures

Method for binding halide-based contaminants during formation of a titanium-based film

Methods of forming pluralities of capacitors, and integrated circuitry

MIS capacitor

Methods of forming capacitor constructions

Method of forming MIS capacitor

Methods of forming conductive material silicides by reaction of metal with silicon

Methods of forming capacitor constructions comprising perovskite-type dielectric materials with different amount of crystallinity regions

Methods of forming conductive metal silicides by reaction of metal with silicon

Method for controlling deposition of dielectric films

Conductive semiconductor structures containing metal oxide regions

Mixed composition interface layer and method of forming

Gas delivery system for pulsed-type deposition processes used in the manufacturing of micro-devices

Method of forming a MIM capacitor with metal nitride electrode

Dielectric cure for reducing oxygen vacancies

Structures and methods for enhancing capacitors in integrated circuits

Method for controlling deposition of dielectric films

CREE INC

Method of manufacturing gallium nitride based high-electron mobility devices

Gallium nitride based high-electron mobility devices

Vertical junction field effect transistor having an epitaxial gate