Inventor

KOMORIYA SUSUMU

JP21 patents

⚠️ This page may combine multiple inventors who share the name “KOMORIYA SUSUMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOMORIYA SUSUMU

HITACHI LTD

Exposure method and exposure apparatus

Exposure method and exposure apparatus

Controlling method of forming thin film, system for said controlling method, exposure method and system for said exposure method

Controlling method of forming thin film, system for said controlling method, exposure method and system for said exposure method

Wafer and method of working the same

Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same

Projection aligner and method of positioning a wafer

Exposure method and exposure apparatus

Method of producing a wafer having a curved notch

Wafer having chamfered bend portions in the joint regions between the contour of the wafer and the cut-away portion of the wafer

Method of and apparatus for aligning photomask

Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same

Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same

ANDO TAKASHI

Imprint device and microstructure transfer method

Pattern transfer method and imprint device

Pattern transfer method and imprint device

Imprinting device

HITACHI HIGH TECH CORP

Nanoimprint resin stamper

OGINO MASAHIKO

Pattern forming method and its mold

MORI KYOICHI

Nanoimprint stamper and a fine-structure transfer apparatus using the stamper

RENESAS TECH CORP

Wafer having chamfered bend portions in the joint regions between the contour of the cut-away portion of the wafer