Inventor
KWON HYO-YOUNG
KR18 patents
⚠️ This page may combine multiple inventors who share the name “KWON HYO-YOUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG SDI CO LTD
10 patentsUS10066057B2Sep 4, 2018
Organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD2 citations70
US9971243B2May 15, 2018
Polymer, organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD2 citations70
US10340148B2Jul 2, 2019
Polymer, organic layer composition, and method of forming patterns
SAMSUNG SDI CO LTD2 citations69
US9873815B2Jan 23, 2018
Polymer, organic layer composition, and method of forming patterns
SAMSUNG SDI CO LTD2 citations68
US9758612B2Sep 12, 2017
Polymer, organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD1 citations48
US9593205B2Mar 14, 2017
Polymer, organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD1 citations48
US10323124B2Jun 18, 2019
Polymer, organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD0 citations38
US9862668B2Jan 9, 2018
Monomer, polymer, organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD0 citations38
US10364221B2Jul 30, 2019
Monomer, organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD0 citations33
US10556986B2Feb 11, 2020
Polymer, organic layer composition, and method of forming patterns
SAMSUNG SDI CO LTD0 citations32
CHEIL IND INC
6 patentsUS9725389B2Aug 8, 2017
Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition
CHEIL IND INC2 citations71
US9556094B2Jan 31, 2017
Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition
CHEIL IND INC6 citations71
US10392459B2Aug 27, 2019
Photocurable composition and device including barrier layer formed from composition
CHEIL IND INC1 citations62
US9329475B2May 3, 2016
Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device
CHEIL IND INC1 citations51
US9606438B2Mar 28, 2017
Resist underlayer composition, method of forming patterns, and semiconductor integrated circuit device including the pattern
CHEIL IND INC0 citations41
US8956790B2Feb 17, 2015
Positive photosensitive resin composition, and organic insulator film for display device and display device fabricated using the same
CHEIL IND INC0 citations41