Inventor · disambiguated record
Wilhelmus Jacobus Maria Rooijakkers
Also filed as: ROOIJAKKERS WILHELMUS J M · ROOIJAKKERS WILHELMUS JACOBUS · ROOIJAKKERS WILHELMUS JACOBUS MARIA
5 granted patents·4 pending applications·3 citations·filing 2006–2016
66Inventor score
Top patents by PatentIndex Score
9 records- 0167US10401734B2Lithographic method and apparatusASML NETHERLANDS BV·Filed 2016·Granted Sep 3, 2019·1 cites·19 claims
- 0266US8124939B2Radiation detectorROOIJAKKERS WILHELMUS JACOBUS MARIA·Filed 2010·Granted Feb 28, 2012·2 cites·18 claims
- 0357US9170498B2Lithographic apparatus and a method for determining a polarization property of a projection system using an adjustable polarizer and interferometric sensorASML NETHERLANDS BV·Filed 2013·Granted Oct 27, 2015·0 cites·12 claims
- 0450US2006203221A1Lithographic apparatus and a method for determining a polarization propertyASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 0549US8269186B2Radiation detectorROOIJAKKERS WILHELMUS JACOBUS MARIA·Filed 2011·Granted Sep 18, 2012·0 cites·18 claims
- 0639US2010118288A1Lithographic projection system and projection lens polarization sensorVAN DE KERKHOF MARCUS ADRIANUS·Filed 2006·Application pending·0 cites
- 0739US2010182582A1Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography toolASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 0839US2010045956A1Lithographic Apparatus, Method for Determining at Least One Polarization Property Thereof, Polarization Analyzer and Polarization Sensor ThereofASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 0935US8760625B2Lithographic apparatus, aberration detector and device manufacturing methodROOIJAKKERS WILHELMUS JACOBUS MARIA·Filed 2011·Granted Jun 24, 2014·0 cites·15 claims
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