Inventor
YOON JAE-MAN
KR77 patents
⚠️ This page may combine multiple inventors who share the name “YOON JAE-MAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
39 patentsUS7382018B2Jun 3, 2008
3-Dimensional flash memory device and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD59 citations98
US7368352B2May 6, 2008
Semiconductor devices having transistors with vertical channels and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD61 citations98
US7332386B2Feb 19, 2008
Methods of fabricating fin field transistors
SAMSUNG ELECTRONICS CO LTD56 citations98
US7323375B2Jan 29, 2008
Fin field effect transistor device and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD108 citations98
US7160780B2Jan 9, 2007
Method of manufacturing a fin field effect transistor
SAMSUNG ELECTRONICS CO LTD22 citations93
US6570200B1May 27, 2003
Transistor structure using epitaxial layers and manufacturing method thereof
SAMSUNG ELECTRONICS CO LTD27 citations93
US7977725B2Jul 12, 2011
Integrated circuit semiconductor device including stacked level transistors
SAMSUNG ELECTRONICS CO LTD20 citations92
US7781287B2Aug 24, 2010
Methods of manufacturing vertical channel semiconductor devices
SAMSUNG ELECTRONICS CO LTD14 citations92
US7781285B2Aug 24, 2010
Semiconductor device having vertical transistor and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD22 citations92
US7586149B2Sep 8, 2009
Circuit device including vertical transistors connected to buried bitlines and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD34 citations92
US7348628B2Mar 25, 2008
Vertical channel semiconductor devices and methods of manufacturing the same
SAMSUNG ELECTRONICS CO LTD30 citations92
US7279774B2Oct 9, 2007
Bulk substrates in FinFETs with trench insulation surrounding FIN pairs having FINs separated by recess hole shallower than trench
SAMSUNG ELECTRONICS CO LTD26 citations92
US7177192B2Feb 13, 2007
Method of operating a flash memory device
SAMSUNG ELECTRONICS CO LTD37 citations92
US7056781B2Jun 6, 2006
Method of forming fin field effect transistor
SAMSUNG ELECTRONICS CO LTD51 citations92
US7531412B2May 12, 2009
Methods of manufacturing semiconductor memory devices including a vertical channel transistor
SAMSUNG ELECTRONICS CO LTD26 citations91
US7015106B2Mar 21, 2006
Double gate field effect transistor and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD35 citations91
US8373214B2Feb 12, 2013
Semiconductor devices with buried bit lines and methods of manufacturing semiconductor devices
SAMSUNG ELECTRONICS CO LTD7 citations84
US8039896B2Oct 18, 2011
Semiconductor memory device with vertical channel formed on semiconductor pillars
SAMSUNG ELECTRONICS CO LTD8 citations84
US8022457B2Sep 20, 2011
Semiconductor memory device having vertical channel transistor and method for fabricating the same
SAMSUNG ELECTRONICS CO LTD13 citations84
US7902026B2Mar 8, 2011
Method of fabricating semiconductor device having vertical channel transistor
SAMSUNG ELECTRONICS CO LTD12 citations84
US7872302B2Jan 18, 2011
Semiconductor device having vertical transistor formed on an active pattern protruding from a substrate
SAMSUNG ELECTRONICS CO LTD10 citations84
US7759198B2Jul 20, 2010
Method of forming semiconductor devices having a vertical channel transistor
SAMSUNG ELECTRONICS CO LTD8 citations84
US7728373B2Jun 1, 2010
DRAM device with cell epitaxial layers partially overlap buried cell gate electrode
SAMSUNG ELECTRONICS CO LTD13 citations84
US7662720B2Feb 16, 2010
3-Dimensional flash memory device and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD8 citations84
US7407845B2Aug 5, 2008
Field effect transistor and method for manufacturing the same
SAMSUNG ELECTRONICS CO LTD13 citations84
US7387931B2Jun 17, 2008
Semiconductor memory device with vertical channel transistor and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD12 citations84
US7317646B2Jan 8, 2008
Memory device having shared open bit line sense amplifier architecture
SAMSUNG ELECTRONICS CO LTD15 citations84
US7166514B2Jan 23, 2007
Semiconductor device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD15 citations84
US7153733B2Dec 26, 2006
Method of fabricating fin field effect transistor using isotropic etching technique
SAMSUNG ELECTRONICS CO LTD14 citations84
US7592686B2Sep 22, 2009
Semiconductor device having a junction extended by a selective epitaxial growth (SEG) layer and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD13 citations83
US7531874B2May 12, 2009
Field effect transistors including source/drain regions extending beneath pillars
SAMSUNG ELECTRONICS CO LTD9 citations82
US7701002B2Apr 20, 2010
Semiconductor device having buried gate electrode and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD15 citations79
US7999309B2Aug 16, 2011
Semiconductor device
SAMSUNG ELECTRONICS CO LTD6 citations74
US7943978B2May 17, 2011
Semiconductor device
SAMSUNG ELECTRONICS CO LTD5 citations74
US7883972B2Feb 8, 2011
Semiconductor device having a fin structure and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD6 citations74
US7560759B2Jul 14, 2009
Semiconductor device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD6 citations74
US7803684B2Sep 28, 2010
Method of fabricating semiconductor device having a junction extended by a selective epitaxial growth (SEG) layer
SAMSUNG ELECTRONICS CO LTD6 citations73
US7288823B2Oct 30, 2007
Double gate field effect transistor and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD7 citations72
US8053307B2Nov 8, 2011
Method of fabricating semiconductor device with cell epitaxial layers partially overlap buried cell gate electrode
SAMSUNG ELECTRONICS CO LTD5 citations63
YOON JAE-MAN
6 patentsUS8058683B2Nov 15, 2011
Access device having vertical channel and related semiconductor device and a method of fabricating the access device
YOON JAE-MAN43 citations94
US8264022B2Sep 11, 2012
Semiconductor device including contact plug and associated methods
YOON JAE-MAN10 citations84
US8293604B2Oct 23, 2012
Methods of manufacturing vertical channel semiconductor devices
YOON JAE-MAN9 citations83
US8791526B2Jul 29, 2014
Vertical type integrated circuit devices and memory devices including conductive lines supported by Mesa structures and methods of fabricating the same
YOON JAE-MAN9 citations82
US8154065B2Apr 10, 2012
Semiconductor memory devices including a vertical channel transistor having a buried bit line
YOON JAE-MAN6 citations82
US8409953B2Apr 2, 2013
Method of manufacturing a semiconductor device
YOON JAE-MAN5 citations73
SK HYNIX INC
3 patentsUS10923390B2Feb 16, 2021
Semiconductor device with air gap and method for fabricating the same
SK HYNIX INC9 citations86
US10622249B2Apr 14, 2020
Semiconductor device with air gap and method for fabricating the same
SK HYNIX INC9 citations84
US12588190B2Mar 24, 2026
Semiconductor device with a low-k spacer and method for fabricating the same
SK HYNIX INC0 citations63
KIM BONG-SOO
1 patentYOON JAE MAN
1 patentShowing the top 50 of 77 patents by PatentIndex Score.